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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Ternary Wide Band Gap p-BIock Metal Semiconductor ZnGa2O4 for Photocatalytic Benzene Degradation
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Ternary Wide Band Gap p-BIock Metal Semiconductor ZnGa2O4 for Photocatalytic Benzene Degradation

机译:三元宽带隙p-BIock金属半导体ZnGa2O4用于光催化降解苯

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摘要

Nanocrystalline ternary wide band gap p-block metal semiconductor ZnGa2O4 was successfully prepared via a coprecipitation method.The as-prepared sample was characterized by X-ray diffraction,N2-sorption BET surface area,UV-vis diffuse reflectance spectroscopy,transmission electron microscopy,high-resolution transmission electron microscopy,and Fourier transformation infrared spectroscopy.ZnGa2O4 showed superior photocatalytic activity and stability for benzene degradation as compared to commercial TiO2.However,its activity was lower than another wide band gap p-block metal semiconductor photocatalyst Sr2Sb2O7.The difference in the photocatalytic activity between ZnGa2O4 and Sr2Sb2O7 can be well explained by their different geometric structures.This result gave some new insight in the development of new ternary wide band gap p-block semiconductor photocatalysts for benzene degradation.
机译:通过共沉淀法成功制备了纳米三元宽带隙p型块状金属半导体ZnGa2O4。通过X射线衍射,N2吸附BET表面积,UV-vis漫反射光谱,透射电子显微镜对制备的样品进行了表征。高分辨率透射电子显微镜和傅里叶变换红外光谱法.ZnGa2O4与商用TiO2相比,显示出优异的光催化活性和对苯降解的稳定性,但是其活性低于另一种宽带隙p嵌段金属半导体光催化剂Sr2Sb2O7。 ZnGa2O4和Sr2Sb2O7之间的不同几何结构可以很好地解释其光催化活性。这一结果为开发新型三元宽带隙p嵌段半导体光催化苯降解提供了新的见识。

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