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首页> 外文期刊>Chemistry of Materials: A Publication of the American Chemistry Society >Thin film transistors based on alkylphenyl quaterthiophenes: Structure and electrical transport properties
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Thin film transistors based on alkylphenyl quaterthiophenes: Structure and electrical transport properties

机译:基于烷基苯基四噻吩的薄膜晶体管:结构和电传输性能

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Thin films based on the akylphenyl-substituted quaterthiophenes 5,5'''-bis(4-methylphenyl)- 2,2': 5', 2": 5', 2'''-quaterthiophene ( 1), 5,5'''-bis(4-n-propylphenyl)-2,2': 5', 2": 5", 2"'-quaterthiophene ( 2), and 5,5'"-bis( 4-hexylphenyl)- 2,2': 5', 2": 5", 2'"-quaterthiophene (3) were grown by vacuum deposition on thermally grown SiO2 substrates and characterized in a thin film transistor (TFT) configuration. Atomic force microscopy and specular (theta-2 theta) X-ray diffraction (XRD) revealed films with small, crystalline grains, in which the oligothiophenes were oriented " end-on" with respect to the SiO2 substrate. Interplanar spacing increased (1 = 28.0 angstrom, 2 = 29.5 angstrom, 3 = 37.7 angstrom), consistent with increasing alkyl tail length. Grazing incidence X-ray diffraction (GIXD) of the films (ca. 350 angstrom thick) revealed nearly equivalent in-plane unit-cell areas ( 1 = 44.1 angstrom(2), 2 = 44.4 angstrom(2), 3 = 43.8 angstrom(2)). The films functioned as p-channel semiconductors in a TFT configuration, exhibiting nearly equivalent hole mobilities (mu approximate to 0.05 +/- 0.01, 0.04 +/- 0.01, 0.06 +/- 0.01 cm(2)/Vs for 1, 2, and 3, respectively). Variable-temperature measurements demonstrated that the activation energy of the mobility for thin films of 3 was similar to 55 meV. The increasing alkyl chain length does not appear to improve molecular ordering; however, the addition of a phenyl end-substituent appears to greatly improve the on-to-off ratio in TFTs.
机译:基于烷基苯基取代的四噻吩5,5'''-双(4-甲基苯基)-2,2':5',2'':5',2'''-四噻吩的薄膜(1),5,5 '''-双(4-正丙基苯基)-2,2':5',2“:5”,2“'-四噻吩(2)和5,5'”-双(4-己基苯基)-通过在热生长的SiO 2衬底上真空沉积来生长2,2':5',2”:5”,2'”-四噻吩(3),并以薄膜晶体管(TFT)构造为特征。原子力显微镜和镜面(theta-2 theta)X射线衍射(XRD)揭示了具有小晶粒的薄膜,其中,低聚噻吩相对于SiO2基材“端头”取向。平面间距增加(1 = 28.0埃,2 = 29.5埃,3 = 37.7埃),与烷基尾长的增加一致。薄膜(约350埃厚)的掠入射X射线衍射(GIXD)显示几乎相等的面内晶胞面积(1 = 44.1埃(2),2 = 44.4埃(2),3 = 43.8埃) (2))。薄膜在TFT构造中充当p沟道半导体,表现出几乎相等的空穴迁移率(mu对于1,2,2大约等于0.05 +/- 0.01、0.04 +/- 0.01、0.06 +/- 0.01 cm(2)/ Vs和3)。可变温度测量表明,薄膜3的迁移率的活化能类似于55 meV。烷基链长度的增加似乎并未改善分子的有序性。但是,添加苯基端取代基似乎可以大大提高TFT的通断比。

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