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STRUCTURE OF THE LIQUID-VAPOR INTERFACE OF A SN-GA ALLOY

机译:SN-GA合金的液-气界面结构

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The atomic distributions along the normal to, and in the plane of, the liquid-vapor interface of a dilute (9:91 at. %) Sn:Ga alloy have been studied by x-ray specular reflectivity and grazing incidence x-ray diffraction at 57 degrees C, 41 degrees C, 26 degrees C, and 12 degrees C. Surface tensions, calculated from sample shape measurements, have also been determined at the same temperatures. The results of these experiments show that the atomic distribution in the liquid-vapor interface of the Sn:Ga alloy studied has both similarities and differences with the atomic distribution in the liquid-vapor interface of a dilute Bi:Ga alloy. In both alloys the atomic distribution along the normal to the liquid-vapor interface is stratified, and the composition of the outermost layer is, sensibly, 100% of the constituent with lower (pure liquid) surface tension, respectively, Sn and Bi. In both alloys the in-plane structure of the outermost layer is that of a liquid. In the homovalent Bi:Ga alloy the excess Bi segregates into a monolayer which forms the outermost layer of the stratified liquid-vapor interface, with no excess Bi in the second or deeper layers of the interface. In the heterovalent Sn:Ga alloy, the excess Sn segregates into both the outermost and the second layers of the stratified liquid-vapor interface. The outermost layer of the interface is found to be pure two-dimensional liquid Sn, in which the atomic diameter is smaller than that in normal liquid Sn by about 6%. In the second layer of the interface the Sn atomic concentration is found to be 22.3+/-1.6% at 57 degrees C and 22.7+/-1.7% at 41 degrees C. Within the limits of our experimental sensitivity, the Sn concentration in deeper levels of the liquid-vapor interface cannot be distinguished from that in the bulk liquid alloy. The surface tension of the (9:91 at. %) Sn:Ga alloy is found to be 671+/-42 dyn/cm at 57 degrees C, 573+/-58 dyn/cm at 41 degrees C, 587+/-50 dyn/cm at 26 degrees C, and 527+/-40 dyn/cm at 12 degrees C. The differences between the structures of the Sn:Ga and Bi:Ga liquid-vapor interfaces are interpreted, qualitatively, in terms of their electron density distributions. (C) 1997 American Institute of Physics. [References: 17]
机译:通过X射线镜面反射率和掠入射X射线衍射研究了稀(9:91 at。%)Sn:Ga合金沿垂直于和垂直于液-气界面的原子分布分别在57摄氏度,41摄氏度,26摄氏度和12摄氏度下进行。通过样品形状测量计算得出的表面张力也已在相同温度下确定。这些实验的结果表明,所研究的Sn:Ga合金的液-汽界面中的原子分布与稀Bi:Ga合金的液-汽界面中的原子分布既有相似之处,也有不同之处。在这两种合金中,沿着液-气界面的法线的原子分布都是分层的,并且最外层的成分明智地是100%具有较低(纯液体)表面张力的成分Sn和Bi。在两种合金中,最外层的平面内结构都是液体的。在同价的Bi:Ga合金中,过量的Bi会分离成单层,形成分层的液-气界面的最外层,而在界面的第二层或深层中则没有过量的Bi。在杂质量的Sn:Ga合金中,过量的Sn偏析到分层液体-蒸汽界面的最外层和第二层。发现界面的最外层是纯二维液体Sn,其原子直径比普通液体Sn中的原子直径小约6%。在界面的第二层中,发现Sn原子浓度在57摄氏度时为22.3 +/- 1.6%,在41摄氏度时为22.7 +/- 1.7%。在我们的实验灵敏度范围内,Sn原子浓度更深。不能将液态-蒸汽界面的水平与块状液态合金中的水平区分开。发现(9:91 at。%)Sn:Ga合金的表面张力在57摄氏度下为671 +/- 42 dyn / cm,在41摄氏度下为573 +/- 58 dyn / cm,587 + /在26摄氏度时为-50 dyn / cm,在12摄氏度时为527 +/- 40 dyn /cm。Sn:Ga和Bi:Ga液体-蒸汽界面的结构之间的差异从质量上解释为它们的电子密度分布。 (C)1997美国物理研究所。 [参考:17]

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