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首页> 外文期刊>Chemistry of Materials: A Publication of the American Chemistry Society >Nickel Oxide Hole Injection/Transport Layers for Efficient Solution-Processed Organic Light-Emitting Diodes
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Nickel Oxide Hole Injection/Transport Layers for Efficient Solution-Processed Organic Light-Emitting Diodes

机译:氧化镍空穴注入/传输层,用于高效溶液处理的有机发光二极管

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Solution-processed nickel oxides (s-NiO_x) are used as hole injection and transport layers in solution-processed organic light-emitting diodes (OLEDs). By increasing the annealing temperature, the nickel acetate precursor fully decomposes and the s-NiO_x film shows larger crystalline grain sizes, which lead to better hole injection and transport properties. UV—ozone treatment on the s- NiO_x surface is carried out to further modify its surface chemistry, improving the hole injection efficiency. The introduction of more dipolar species of nickel oxy- hydroxide (NiO(OH)) is evidenced after the treatment. Dark injection-space charge limited (DI—SCL) transient measurement was carried out to compare the hole injection efficiency of s-NiO_x and poly(3,4-ethylenedioxythiophene):poly- (styrenesulfonate) (PEDOT:PSS) hole injection layers (HIL). The UV—ozone treated s-NiO_x shows significantly better hole injection, with a high injection efficiency of 0.8. With a p-type thin film transistor (TFT) configuration, the high-temperature annealed s-NiO_x film shows a hole mobility of 0.141 cm~2 V~(-1) s~(-1), which is significantly higher compared to conventional organic hole transport layers (HTLs).
机译:溶液处理的氧化镍(s-NiO_x)用作溶液处理的有机发光二极管(OLED)中的空穴注入和传输层。通过提高退火温度,乙酸镍前体会完全分解,并且s-NiO_x膜显示出较大的晶粒尺寸,从而导致更好的空穴注入和传输性能。进行s- NiO_x表面的UV-臭氧处理以进一步改变其表面化学性质,从而提高空穴注入效率。处理后,证明引入了更多偶极种类的氢氧化镍镍(NiO(OH))。进行了暗注入空间电荷受限(DI-SCL)瞬态测量,以比较s-NiO_x和聚(3,4-乙撑二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)空穴注入层的空穴注入效率( HIL)。经紫外线臭氧处理的s-NiO_x表现出明显更好的空穴注入,注入效率高达0.8。使用p型薄膜晶体管(TFT)配置时,经高温退火的s-NiO_x膜的空穴迁移率为0.141 cm〜2 V〜(-1)s〜(-1),与常规有机空穴传输层(HTL)。

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