The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry

摘要

The site-specific rates of isopropanol reaction on Si(111) were studied by kinetic competition with an etchant of known anisotropy and quantified using concentration-dependent changes in the etched surface morphology using a combination of STM measurements and kinetic Monte Carlo simulations. The isopropoxide ion was identified as the active species.