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Conductivity of boron-doped polycrystalline diamond films: influence of specific boron defects

机译:掺硼多晶金刚石薄膜的电导率:特定硼缺陷的影响

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The resistivity of boron doped polycrystalline diamond films changes with boron content in a very complex way with many unclear factors. From the large number of parameters affecting boron doped polycrystalline diamond film's conductivity we focused on the role of boron atoms inside diamond grains in terms of boron contribution to the continuum of diamond electronic states. Using a combination of theoretical and experimental techniques (plane-wave Density Functional Theory, Neutron Depth Profiling, resistivity and Hall effect measurements, Atomic Force Microscopy and Raman spectroscopy) we studied a wide range of B defect parameters - the boron concentration, location, structure, free hole concentration and mobility. The main goal and novelty of our work was to find the influence of B defects (structure, interactions, charge localisation and spins) in highly B-doped diamonds - close or above the metal-insulator transition - on the complex material charge transport mechanisms.
机译:掺硼多晶金刚石薄膜的电阻率以非常复杂的方式随硼含量的变化而变化,其中存在许多不确定的因素。从影响硼掺杂多晶金刚石薄膜电导率的大量参数中,我们关注硼在金刚石晶粒内的硼原子在连续性方面对金刚石电子态的贡献。结合理论和实验技术(平面波密度泛函理论,中子深度轮廓分析,电阻率和霍尔效应测量,原子力显微镜和拉曼光谱),我们研究了各种B缺陷参数-硼浓度,位置,结构,自由孔浓度和迁移率。我们工作的主要目的和新颖性是发现高B掺杂金刚石中(接近或高于金属-绝缘体转变)B缺陷(结构,相互作用,电荷局部化和自旋)对复杂材料电荷传输机制的影响。

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