首页> 外文期刊>The European physical journal, D. Atomic, molecular, and optical physics >Electron impact ionization of atomic clusters in ultraintense laser fields
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Electron impact ionization of atomic clusters in ultraintense laser fields

机译:超强激光场中原子团簇的电子碰撞电离

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In this paper we report on inner ionization of Xe-n clusters ( n = 55-2171) in ultraintense Gaussian laser fields ( peak intensity I = 10(15)- 10(20) W cm(-2), pulse width tau = 25 fs, frequency 0.35 fs(-1)). The cluster inner ionization process is induced by the barrier suppression ionization ( BSI) mechanism and by electron impact ionization (EII), which occurs sequentially with the BSI. We address electron impact ionization of clusters, which pertains to inelastic reactive processes of the high-energy (100 eV-1 keV per electron) nanoplasma. We utilized experimental data for the energy dependence of the electron impact ionization cross-sections of Xej+ ( j = 1- 10) ions, which were fit by an empirical three-parameter Lotz-type equation, to explore EII in clusters by molecular dynamics simulations. Information was obtained on the yields and time-resolved dynamics of the EII levels (i.e., number n(imp) of electrons per cluster atom) in the X(e)n clusters and their dependence on the laser intensity and cluster size. The relative long-time ( t = 90 fs) yields for EII, n(imp)(ii) (where n(ii) is the total inner ionization yield) are rather low and increase with decreasing the laser intensity. In the intensity range I = 10(15)- 10(16) Wcm(-2), n(imp)(ii) = 0.21 for n = 2171 and n(imp)(ii) = 0.09- 0.14 for n = 459, while for I = 10(18)- 10(20) Wcm(-2), n(imp)(ii) = 0.01-0.05. The difference Delta n(imp) between the EII yield at long time and at the termination of the laser pulse reflects on ionization dynamics by the nanoplasma when the laser pulse is switched off. For Xe-2171 in the lower intensity domain, Delta n(imp) = 0.9 at I = 10(15) Wcm(-2) and Delta n(imp) = 0.4 at 10(16) Wcm(-2), reflecting on EII by the persistent nanoplasma under "laser free" conditions, while in the higher intensity domain of I = 10(17)- 10(18) Wcm(-2), Delta n(imp) is negligibly small due to the depletion of the transient nanoplasma.
机译:在本文中,我们报告了在高强度高斯激光场(峰值强度I = 10(15)-10(20)W cm(-2),脉冲宽度tau = 25 fs,频率0.35 fs(-1))。团簇内部电离过程是由势垒抑制电离(BSI)机理和电子碰撞电离(EII)引起的,电子碰撞电离与BSI依次发生。我们解决簇的电子碰撞电离,这涉及高能(每个电子100 eV-1 keV)纳米等离子体的非弹性反应过程。我们利用实验数据作为Xej +(j = 1- 10)离子的电子碰撞电离截面的能量依赖性,并通过经验三参数Lotz型方程拟合,通过分子动力学模拟探索簇中的EII 。获得了有关X(e)n团簇中EII能级的产率和时间分辨动力学的信息(即每个团簇原子的电子数n(imp)),以及它们对激光强度和团簇大小的依赖性。 EII的相对长时间(t = 90 fs)产量n(imp)/ n(ii)(其中n(ii)是总内部电离产量)相当低,并且随着激光强度的降低而增加。在强度范围I = 10(15)-10(16)Wcm(-2)中,对于n = 2171和n(imp)/ n(ii)= 0.09- 0.14,n(imp)/ n(ii)= 0.21对于n = 459,而对于I = 10(18)-10(20)Wcm(-2),n(imp)/ n(ii)= 0.01-0.05。长时间关闭和在激光脉冲终止时的EII产量之间的差异Delta n(imp)反映了当关闭激光脉冲时纳米等离子体的电离动力学。对于较低强度域中的Xe-2171,在I = 10(15)Wcm(-2)时Delta n(imp)= 0.9,在10(16)Wcm(-2)时Delta n(imp)= 0.4持久纳米等离子体在“无激光”条件下的EII,而在I = 10(17)-10(18)Wcm(-2)的较高强度域中,由于n的耗尽,δn(imp)很小,可以忽略不计。瞬态纳米等离子体。

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