A Scientist's Perspective on the Early Days of 108 Technology

摘要

In September 1957,Frosch and Derick of Bell Telephone Laboratories published a seminal paper in the Journal of The Electrochemical Society concerning the use of silicon dioxide as a selective mask against dopant diffusion into silicon wafers.This oxide layer was soon shown to passivate the underlying p-n junctions.Subsequent Bell Labs work involved the fabrication of both bipolar and the newly developed metal-oxide-semiconductor,or MOS,transistors.