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Multiphysical simulation analysis of the dislocation structure in germanium single crystals

机译:锗单晶位错结构的多物理场模拟分析

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To grow high-quality germanium crystals is one of the most important problems of growth industry. The dislocation density is an important parameter of the quality of single crystals. The dislocation densities in germanium crystals 100 mm in diameter, which have various shapes of the side surface and are grown by the Czochralski technique, are experimentally measured. The crystal growth is numerically simulated using heat-transfer and hydrodynamics models and the Alexander-Haasen dislocation model in terms of the CGSim software package. A comparison of the experimental and calculated dislocation densities shows that the dislocation model can be applied to study lattice defects in germanium crystals and to improve their quality.
机译:生长高质量的锗晶体是生长行业最重要的问题之一。位错密度是单晶质量的重要参数。实验测量了直径为100 mm的锗晶体的位错密度,该晶体具有各种形状的侧面并且通过切克劳斯基技术生长。根据CGSim软件包,使用传热和流体动力学模型以及Alexander-Haasen位错模型对晶体生长进行了数值模拟。实验和计算的位错密度的比较表明,位错模型可用于研究锗晶体的晶格缺陷并提高其质量。

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