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Measuring van der Waals and electrostatic forces for an atomic force microscope probe contacting with metal surfaces

机译:测量原子力显微镜探针与金属表面接触时的范德华力和静电力

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摘要

A contact force spectrometry technique was used to measure the van der Waals and electrostatic forces acting on platinum-coated silicon probes contacting with metal films on silicon substrates. It is shown that the results of such measurements can be used for determining the geometric characteristics of probes and the Hamaker constant of contacting materials. The experimental data well agree with the theoretical values.
机译:接触力光谱技术用于测量范德华力和作用在铂涂层的硅探针上的范德华力和静电力,该探针与硅基板上的金属膜接触。结果表明,这种测量结果可用于确定探针的几何特性和接触材料的Hamaker常数。实验数据与理论值吻合良好。

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