The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy

摘要

The structure of alumina (Al _2O _3) films of various thicknesses grown by the atomic layer deposition method on porous silica (por-SiO _2) substrates has been studied using soft X-ray reflection spectroscopy. It is established that the synthesized films are amorphous and that the ratio of Al atoms with tetrahedral and octahedral coordinations in a film depends on its thickness. It can be suggested that thicker Al _2O _3 films contain a greater proportion of Al atoms with tetrahedral coordination.