Synthesis of Ti3Al and TiAl based surface alloys by pulsed electron-beam melting of Al(film)/Ti(substrate) system

摘要

Phase formation and surface hardening in the 100-nm-thick Al(film)/Ti(substrate) system under conditions of pulsed electron-beam melting (~15 keV, ~3 μs, 3-4 J/cm~2) have been studied depending on the number of film deposition-melting cycles. Using this method, submicrocrystalline and nanocrystalline surface alloys with thicknesses ≥3 μm based on Ti_3Al and TiAl intermetallics have been obtained on the titanium substrate.