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首页> 外文期刊>Quantum electronics >Effect of external electric field and background illumination on the intensity distribution of optical surface waves in the metal - Photorefractive crystal system
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Effect of external electric field and background illumination on the intensity distribution of optical surface waves in the metal - Photorefractive crystal system

机译:外部电场和背景照明对金属-光折变晶体系统中光学表面波强度分布的影响。

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The influence of the external electric field and background illumination on the intensity distribution of optical photorefractive surface waves at the metal - photorefractive crystal interface has been numerically simulated. The simulation is performed for a strontium - barium niobate (SBN) crystal using the parameters corresponding to the experimental data. The replacement of a real metal with an ideal one and the choice of the corresponding boundary conditions (depending on the wave power) in the numerical simulation have been substantiated. The calculation results have shown good agreement with the previously published experimental data on the effect of background illumination and a significant discrepancy for the data on the effect of the external electric field. It is found that the effect of the external electric field can be significantly enhanced by reducing the optical power of the photorefractive wave to values close to the threshold ones.
机译:数值模拟了外部电场和背景照明对金属-光折变晶体界面上光折光面波强度分布的影响。使用对应于实验数据的参数对铌酸锶钡(SBN)晶体进行了仿真。在数值模拟中,已经证实了用一种理想的金属代替一种真实的金属,以及选择了相应的边界条件(取决于波功率)。计算结果与先前发表的关于背景照明效果的实验数据显示出良好的一致性,并且与有关外部电场影响的数据存在显着差异。已经发现,通过将光折射波的光功率减小到接近阈值的值,可以显着增强外部电场的作用。

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