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Effect of the prepulse electron density and population of the lower laser level on the pulse repetition rate achievable in a copper vapour laser

机译:预脉冲电子密度和较低激光强度的填充对铜蒸气激光器中可达到的脉冲重复率的影响

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摘要

Factors are considered which restrict the limiting pulse repetition rate in a copper vapour laser. The existence of a critical prepulse electron density discussed in a paper of S.I.Yakovlenko [Quantum Electronics, 30, 501 (2000)] and new arguments in favour of the existence of the critical electron density reported in a paper of A.M. Boichenko and S.I.Yakovlenko [Quantum Electronics, 32, 172 (2002)] are analysed. The conclusion is made that the new arguments do not prove the existence of the critical electron density as well.
机译:考虑了限制铜蒸气激光器中的极限脉冲重复率的因素。 S.I.Yakovlenko [Quantum Electronics,30,501(2000)]的论文中讨论了临界前脉冲电子密度的存在,以及在A.M. A.M.论文中报道了支持临界电子密度存在的新论点。分析了Boichenko和S.I. Yakovlenko [Quantum Electronics,32,172(2002)]。结论是,新的论据也不能证明临界电子密度的存在。

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