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Hard x-ray radiation yield from a dense plasma as a function of the wavelength of the heating ultrashort laser pulse

机译:致密等离子体产生的硬X射线辐射随加热超短激光脉冲的波长而变化

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The effect of intensity, length, and wavelength of an ultrashort laser pulse on the formation of a hot electron component in a dense laser-produced plasma was first investigated in a single experiment. For a pulse length of 1 ps (or 200 fs, but with an energy contrast ratio of ~20), it was shown that the principal mechanism of generation of hot electrons is the resonance absorption of laser radiation and that the temperature of hot electrons depends on the laser pulse intensity I and the wavelength λ as T_h ~ (Iλ~2)~(1/3). The homogenisation of the nanostructures of porous silicon due to a poor contrast ratio or a long duration (1 ps) of the laser pulse lowers the yield of hard x-ray radiation compared to the case of high-contrast 200-fs pulses.
机译:首先在单个实验中研究了超短激光脉冲的强度,长度和波长对在致密激光产生的等离子体中热电子成分形成的影响。对于1 ps(或200 fs,但能量对比度为〜20)的脉冲长度,表明产生热电子的主要机理是激光辐射的共振吸收,并且热电子的温度取决于激光脉冲强度I和波长λ为T_h〜(Iλ〜2)〜(1/3)。与高对比度200-fs脉冲相比,由于不良的对比度或较长的激光脉冲持续时间(1 ps),多孔硅纳米结构的均质性降低了硬X射线辐射的产率。

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