首页> 外文期刊>Protection of Metals and Physical Chemistry of Surfaces >Plasma-Electrolytic Formation of Ta-Containing Oxide Coatings on Titanium--Their Composition and Properties
【24h】

Plasma-Electrolytic Formation of Ta-Containing Oxide Coatings on Titanium--Their Composition and Properties

机译:钛上含Ta氧化物涂层的等离子体电沉积法-它们的组成和性能

获取原文
获取原文并翻译 | 示例
           

摘要

Coatings with a thickness of 2-18 μm that contain up to 20 at % tantalum and Ta_2O_5 oxide phase are formed in an aqueous NH_4[TaF_6]-containing electrolyte for 2 min. The coatings are pierced with pores with a size of from 0.5 to 2 um. The number of pores in the coatings can be decreased by additionally applying a Ta-containing paste to the surface. The contact angle of the coatings in distilled water is 68°-85°. This approach is promising for application of Ta-containing coatings on titanium implants and stents for increasing their corrosion resistance, chemical inertness, and biocompatibility.
机译:在含NH_4 [TaF_6]的电解质水溶液中形成2分钟的厚度为2-18μm的涂层,其中包含高达20 at%的钽和Ta_2O_5氧化物相。涂层上打有尺寸为0.5至2 um的孔。可以通过在表面上额外添加含Ta的糊剂来减少涂层中的孔数量。涂层在蒸馏水中的接触角为68°-85°。这种方法有望将含Ta的涂层应用于钛植入物和支架,以提高其耐腐蚀性,化学惰性和生物相容性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号