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首页> 外文期刊>Progress in Organic Coatings: An International Review Journal >Investigation of morphological and electrical properties of the PMMA coating upon exposure to UV irradiation based on AFM studies
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Investigation of morphological and electrical properties of the PMMA coating upon exposure to UV irradiation based on AFM studies

机译:基于AFM研究,研究PMMA涂层在紫外线照射下的形貌和电学性能

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摘要

The objective of study was to investigate the influence of UV irradiation on morphological changes of a polymeric surface and its electrical properties. In the presented investigation thin poly(methyl methacrylate) (PMMA) film was applied onto iron substrate by solution casting method. UV-C irradiation in range of 200-280 nm was used as a deteriorative factor to induce polymer degradation. Atomic force microscopy (AFM) method was employed to study surface topography of the PMMA coatings before and after exposure to UV-illumination. Photo-induced changes in the polymer surface taking form of microcracks were illustrated by AFM images. In order to support results obtained with AFM method, electrochemical impedance spectroscopy (EIS) measurements were conducted. The authors chose this technique to confirm whether the changes on UV-exposed PMMA surface observed on AFM images could indicate potential sites of the polymer coating long before serious damage could occur. Both methods EIS and AFM were used in order to provide information about durability of PMMA film.
机译:研究的目的是研究紫外线辐射对聚合物表面形态变化及其电性能的影响。在本研究中,通过溶液浇铸法将薄的聚甲基丙烯酸甲酯(PMMA)薄膜施加到铁基板上。使用200-280 nm范围内的UV-C辐射作为导致聚合物降解的劣化因素。原子力显微镜(AFM)方法用于研究PMMA涂层在暴露于紫外线照射之前和之后的表面形貌。 AFM图像说明了以微裂纹形式出现的聚合物表面的光诱导变化。为了支持使用AFM方法获得的结果,进行了电化学阻抗谱(EIS)测量。作者选择了这项技术,以确认在AFM图像上观察到的紫外线暴露的PMMA表面上的变化是否可以指示聚合物涂层的潜在位置,而这远未发生严重损坏。为了提供有关PMMA薄膜耐久性的信息,使用了EIS和AFM两种方法。

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