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Electrodeposition of silane films on aluminum alloys for corrosion protection

机译:在铝合金上电沉积硅烷膜以防腐蚀

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摘要

In this paper, three types of protective silane films, methyltrimethoxysilane (MTMS), vinyltrimethoxysilane (VTMS) and dodecyltrimethoxysilane (DTMS) were prepared on aluminum alloys AA 2024-T3 by electrodeposition technique. The Reflection-Absorption Fourier Transform IR (FTRA-IR) measurements showed that, the silane films were successfully deposited through chemical bonding between silane agents and Al alloys. Electrochemical impedance spectroscopy (EIS) tests indicated that in comparison with those by conventional "dip-coating" method, silane films electrochemically prepared at cathodic potentials exhibited obviously higher corrosion resistances. "Critical potential" was all observed for each silane system. Silane films prepared at this potential performed the highest corrosion resistance. The scanning electron microscopy (SEM) images indicated a potential dependence of surface morphology of silane films. The highest compactness was obtained at the "critical potential". Due to the presence of long hydrophobic dodecyl chain in bone structure, DTMS films displayed the highest barrier properties. (c) 2006 Elsevier B.V. All rights reserved.
机译:本文通过电沉积技术在铝合金AA 2024-T3上制备了三种类型的保护性硅烷膜:甲基三甲氧基硅烷(MTMS),乙烯基三甲氧基硅烷(VTMS)和十二烷基三甲氧基硅烷(DTMS)。反射吸收傅里叶变换红外光谱(FTRA-IR)测量表明,硅烷薄膜是通过硅烷试剂与铝合金之间的化学键合成功沉积的。电化学阻抗谱(EIS)测试表明,与传统的“浸涂”方法相比,在阴极电势下电化学制备的硅烷膜表现出明显更高的耐腐蚀性。对于每种硅烷体系均观察到“临界电势”。在此电位下制备的硅烷膜具有最高的耐腐蚀性。扫描电子显微镜(SEM)图像表明硅烷膜表面形态的潜在依赖性。在“临界电势”下可获得最高的致密性。由于骨骼结构中存在长的疏水性十二烷基链,DTMS薄膜显示出最高的阻隔性能。 (c)2006 Elsevier B.V.保留所有权利。

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