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首页> 外文期刊>Plating & Surface Finishing >Catalytic Activity of Sputtered Palladium Films For Electroless Nickel PLATING Studied Using a Quartz Crystal Microbalance
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Catalytic Activity of Sputtered Palladium Films For Electroless Nickel PLATING Studied Using a Quartz Crystal Microbalance

机译:用石英晶体微天平研究溅射钯薄膜对化学镀镍的催化活性

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摘要

The catalytic activity of palladium films sputtered on a quartz resonator was studied using a nickel bath in which a quartz crystal microbalance was used to determine electroless plating processes. An adhesive interface between the Pd layer and the quartz surface Influenced activity. A chromium underlayer suppressed the catalytic activity of Pd film, but a gold underlayer did not. A palladium layer formed on Au a layer operated as a catalyst. The catalytic activity of Pd film on the Cr underlayer was greatly enhanced by cathodic treatment in dilute hydrochloric acid.
机译:使用镍浴研究了溅射在石英谐振器上的钯膜的催化活性,其中使用石英晶体微量天平确定化学镀工艺。 Pd层和石英表面之间的粘合界面会影响活性。铬底层抑制了Pd膜的催化活性,而金底层则没有。在作为催化剂的Au层上形成的钯层。通过在稀盐酸中进行阴极处理,大大提高了Pd膜在Cr底层上的催化活性。

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