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首页> 外文期刊>Polymer engineering and science >Surface segregation of siloxane containing component in polysiloxane-block-polyimide and s-BPDA/ODA polyimide blends
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Surface segregation of siloxane containing component in polysiloxane-block-polyimide and s-BPDA/ODA polyimide blends

机译:聚硅氧烷嵌段聚酰亚胺和s-BPDA / ODA聚酰亚胺共混物中含硅氧烷成分的表面偏析

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摘要

Surface segregation in polymer blend systems between 3,3',4,4'-biphenyltetracarboxylic dianhydride/4,4'-diaminodiphenyl ether (s-BPDA/ODA) polyimide and block copolymer based on polysiloxane-block-polyimide (SPI) has been investigated. These polyimide blends, having various compositions of the SPI, were processed by a solution casting method. The glass substrate used in the film-casting process shows significant effect on the migration of surface segregated species to enrich the air-exposed surface, whereas the more polar s-BPDA/ODA tends to remain close to the polar glass substrate. X-ray photoelectron spectroscopy reveals that even at low SPI concentration, the siloxane moieties in the block copolymer tend to segregate into the air side surface. Contact angle measurement evidently indicates an enrichment of the hydrophobic siloxane fraction on the blend film surface. The average water contact angle of glass side surface is 77 degrees C whereas that of the air side is about 102 degrees C in every blend ratio. This behavior confirms the surface segregation phase separation in these polymer blends. Finally, the surface morphology observed by atomic force microscopy also suggests segregation type of phase separation in these blend systems.
机译:3,3',4,4'-联苯四甲酸二酐/ 4,4'-二氨基二苯醚(s-BPDA / ODA)聚酰亚胺与基于聚硅氧烷-嵌段-聚酰亚胺的嵌段共聚物之间的聚合物共混体系表面分离调查。这些具有各种SPI组成的聚酰亚胺共混物通过溶液浇铸法进行加工。薄膜浇铸过程中使用的玻璃基板对表面分离物质的迁移具有显着影响,以丰富暴露于空气的表面,而极性更大的s-BPDA / ODA倾向于保持靠近极性玻璃基板。 X射线光电子能谱显示,即使在低SPI浓度下,嵌段共聚物中的硅氧烷部分也趋向于分离到空气侧面。接触角的测量显然表明在共混膜表面上疏水硅氧烷部分的富集。在每个混合比中,玻璃侧面的平均水接触角为77℃,而空气侧面的平均水接触角为约102℃。该行为证实了这些聚合物共混物中的表面偏析相分离。最后,通过原子力显微镜观察到的表面形态还暗示了这些共混体系中相分离的分离类型。

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