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首页> 外文期刊>PowerPlant Chemistry: The Journal of All Power Plant Chemistry Areas >Update on the Development of Ultra-Low Residual Resin for Condensate Polishing Applications
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Update on the Development of Ultra-Low Residual Resin for Condensate Polishing Applications

机译:用于冷凝水抛光的超低残留树脂开发最新动态

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摘要

This paper reports on the application of a strongly basic anion resin with ultra-low residual chloride content. The first resin charge installed five years ago at a pressurized water reactor nuclear power station remains in service, having produced more than 26 billion liters of condensate without any regeneration and with a current chloride leakage of significantly less than 10 ng ? L"1. The development and testing of an ultra-low sulfate strongly acidic cation resin, particularly for use in condensate polishers in boiling water reactor units, is also discussed. Data from plant trials is presented.
机译:本文报道了具有极低残留氯含量的强碱性阴离子树脂的应用。五年前安装在压水堆核电站的第一批树脂装料仍在使用,已经产生了超过260亿升的冷凝物,没有任何再生,目前的氯化物泄漏量大大低于10 ng?。 L” 1。还讨论了一种超低硫酸盐强酸性阳离子树脂的开发和测试,特别是用于沸水反应堆装置中的凝结水精处理的装置。并提供了来自工厂试验的数据。

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