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首页> 外文期刊>Plasma Sources Science & Technology >Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms
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Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

机译:通过定制的电压波形以恒定的离子通量和恒定的平均离子能控制离子能分布的形状

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摘要

In this paper, we investigate the excitation of a capacitively coupled plasma using a non-sinusoidal voltage waveform whose amplitude-and slope-asymmetry varies continuously with a period which is a multiple of the fundamental RF period. We call this period the 'beating' period. Through particle-in-cell (PIC) simulations, we show that such waveforms cause oscillation of the self-bias at this beating frequency, corresponding to the charging and discharging of the external capacitor. The amplitude of this self-bias oscillation depends on the beating period, the value of the external capacitor, and the ion flux to the electrodes. This self-bias oscillation causes temporal modulation of the ion flux distribution function (IFDF), albeit at a constant ion flux and constant mean ion energy, and allows the energy width of the IFDF (averaged over the beating period) to be varied in a controlled fashion.
机译:在本文中,我们使用非正弦电压波形来研究电容耦合等离子体的激励,该非正弦电压波形的幅度和斜率非对称性以一个周期为基本RF周期的倍数连续变化。我们称这个时期为“跳动”时期。通过电池中的粒子(PIC)仿真,我们显示了这种波形在此跳动频率下引起自偏压的振荡,这与外部电容器的充电和放电相对应。这种自偏置振荡的幅度取决于拍打周期,外部电容器的值以及到达电极的离子通量。这种自偏置振荡会导致离子通量分布函数(IFDF)的时间调制,尽管在恒定的离子通量和恒定的平均离子能量下也是如此,并且允许IFDF的能量宽度(在打浆周期内平均)变化。控制时尚。

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