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Organically modified montmorillonite polymer nanocomposites for stereolithography building process

机译:有机改性的蒙脱土聚合物纳米复合材料,用于立体光刻工艺

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摘要

Novel photopolymerizable nanocomposite formulations, able to photopolymerize with a dual curing mechanism (cationic and radical), were developed, characterized and used in the stereolithography (SL) process for the construction of 3D objects with a very simple geometry. The influence of the presence of organically modified montmorillonite (OM) nanoparticles on the reactivity of the photopolymerizable liquid mixtures was firstly analyzed, as function of the amount of nanofiller, by photocalorimetric analysis (p-DSC). The basal distance of OM before and after mixing with the photocurable formulation was characterized by X-ray diffraction. Composites with higher content of OM show an intercalated structure. An exfoliated structure was instead observed in the composites with the lowest OM content, after photocuring in the SL apparatus. These results were also confirmed by the morphological analysis performed by SEM. The glass transition temperature of nanocomposites, photocured by stereolithography, was finally measured by TMA and DSC techniques, confirming that the photocurable formulation loaded with the lowest amount of OM presents improved properties than the unloaded formulation. Copyright (c) 2014 John Wiley & Sons, Ltd.
机译:能够通过双重固化机制(阳离子和自由基)进行光聚合的新型可光聚合纳米复合材料配方,已被开发,表征并用于立体光刻(SL)工艺中,用于构造具有非常简单几何形状的3D对象。首先通过光量热分析(p-DSC)分析了有机改性蒙脱土(OM)纳米粒子的存在对可光聚合液体混合物反应性的影响,该反应是纳米填料量的函数。通过X射线衍射表征与光固化制剂混合之前和之后的OM的基础距离。 OM含量较高的复合材料表现出插层结构。在SL设备中进行光固化后,在具有最低OM含量的复合材料中观察到剥离的结构。这些结果也由SEM进行的形态分析证实。最终,通过TMA和DSC技术测量了通过立体平版印刷术光固化的纳米复合材料的玻璃化转变温度,从而证实了负载量最低的OM的光固化制剂比未加载的制剂具有更好的性能。版权所有(c)2014 John Wiley&Sons,Ltd.

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