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Preparation and dielectric properties of polyimide/silica nanocomposite films prepared from sol-gel and blending process

机译:溶胶-凝胶法及共混法制备聚酰亚胺/二氧化硅纳米复合薄膜的制备及介电性能

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Using poly(amic acid) (PAA) as a precursor followed by thermal imidization, the polyimide/silica nanocomposite films were prepared via an improved sol-gel process and a blending process, respectively. FT-IR, TEM and TGA measurements were used to characterize the structure and properties of the obtained films. The results confirmed that the introduction of silica did not yield negative effects on the conversion of the PAA precursor to the polyimide. With the increase of silica content, the aggregation of silica appeared in the polyimide matrix, and the thermal stability decreased slightly for both kinds of films. The dielectric constant (e) of both films increased slowly with the increase of the silica concentration. The dielectric constant of the obtained polyimide/silica nanocomposite films displayed good stability within a wide range of temperatures or frequency. Based on modeling relation between e and silica content, the difference in dielectric properties for two kinds of nanocomposites are discussed.
机译:使用聚(酰胺酸)(PAA)作为前体,然后进行热酰亚胺化,分别通过改进的溶胶-凝胶法和共混法制备了聚酰亚胺/二氧化硅纳米复合膜。使用FT-IR,TEM和TGA测量来表征所得薄膜的结构和性能。结果证实,二氧化硅的引入不会对PAA前体向聚酰亚胺的转化产生负面影响。随着二氧化硅含量的增加,聚酰亚胺基体中出现了二氧化硅的聚集,并且两种膜的热稳定性均略有下降。两种膜的介电常数(e)随二氧化硅浓度的增加而缓慢增加。所获得的聚酰亚胺/二氧化硅纳米复合膜的介电常数在很宽的温度或频率范围内显示出良好的稳定性。基于e和二氧化硅含量之间的模型关系,讨论了两种纳米复合材料介电性能的差异。

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