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首页> 外文期刊>Polymer Composites >Octa(aminophenyl) Polyhedral Oligomeric Silsesquioxane/Boron-Containing Phenol-Formaldehyde Resin Nanocomposites: Synthesis, Cured, and Thermal Properties
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Octa(aminophenyl) Polyhedral Oligomeric Silsesquioxane/Boron-Containing Phenol-Formaldehyde Resin Nanocomposites: Synthesis, Cured, and Thermal Properties

机译:八(氨基苯基)多面体低聚倍半硅氧烷/含硼的苯酚-甲醛树脂纳米复合材料:合成,固化和热性能

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摘要

Octa(aminophenyl) polyhedral oligomeric silsesquiox-ane (OAP-POSS) and boron-containing phenol-formaldehyde resin (BPFR) were synthesized, respectively. The BPFR nanocomposites with different OAP-POSS content (wt%) were prepared, and their properties were characterized. The results show that the thermal degradation process of this nanocomposites can be divided into three stages, and they are all following the first order mechanism. The residual ratio and thermal degradation activation energy Ea of 9 wt% OAP-POSS/ BPFR nanocomposites are both better than others and the Ea increase gradually in three stages, which is 93.3, 134.0, and 181.9 kJ mol~(-1), respectively. Its residual ratio at 900 C is 36.48%. The mechanical loss peak temperature Tp is 228°C for 12 wt% OAP-POSSS/BPFR nanocomposites, which is higher 48 C than pure BPFR. POLYM. COMPOS., 32:829-836, 2011.
机译:分别合成了八(氨基苯基)多面体低聚倍半硅氧烷(OAP-POSS)和含硼酚醛树脂(BPFR)。制备了不同OAP-POSS含量(wt%)的BPFR纳米复合材料,并对其性能进行了表征。结果表明,该纳米复合材料的热降解过程可分为三个阶段,并且都遵循一级机理。 9 wt%OAP-POSS / BPFR纳米复合材料的残存率和热降解活化能Ea均好于三个阶段,分别为93.3、134.0和181.9 kJ mol〜(-1)。 。其在900℃下的残留率为36.48%。对于12 wt%的OAP-POSSS / BPFR纳米复合材料,机械损耗峰值温度Tp为228°C,比纯BPFR高48C。 POLYM。 COMPOS。,32:829-836,2011。

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