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Analysis of electron thermal diffusivity and bootstrap current in ohmically heated discharges after boronization in the HT-7 tokamak

机译:HT-7托卡马克镀硼后欧姆加热放电中电子的热扩散率和自举电流分析

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摘要

Significant improvements of plasma performance after ICRF boronization have been achieved in the full range of HT-7 operation parameters. Electron power balance is analyzed in the steady state ohmic discharges of the HT-7 tokamak. The ratio of the total radiation power to ohmic input power increases with increasing the central line-averaged electron density, but decreases with plasma current. It is obviously decreased after wall conditioning. Electron heat diffusivity X, deduced from the power balance analysis is reduced throughout the main plasma after boronization. X, decreases with increasing central line-averaged electron density in the parameter range of our study. After boronization, the plasma current profile is broadened and a higher current can be easily obtained on the HT-7 tokamak experiment. It is expected that the fact that the bootstrap current increases after boronization will explain these phenomena. After boronization, the plasma pressure gradient and the electron temperature near the boundary are larger than before, these factors influencing that the ratio of bootstrap current to total plasma current increases from several percent to above 10%. (c) 2005 Pleiades Publishing, Inc.
机译:在整个HT-7操作参数范围内,实现了ICRF硼化后等离子体性能的显着改善。在HT-7托卡马克的稳态欧姆放电中分析电子功率平衡。总辐射功率与欧姆输入功率之比随中心线平均电子密度的增加而增加,但随等离子体电流而减小。墙面调节后,它明显减少。从功率平衡分析得出的电子热扩散率X在硼化后在整个主等离子体中减小。在我们研究的参数范围内,X随着中心线平均电子密度的增加而减小。硼化后,等离子体电流分布变宽,并且在HT-7托卡马克实验中可以轻松获得更高的电流。可以预料,在硼化之后,自举电流会增加,这将解释这些现象。硼化后,等离子体压力梯度和边界附近的电子温度都比以前大,这些因素影响了自举电流与总等离子体电流之比从百分之几增加到百分之十以上。 (c)2005年Pleiades Publishing,Inc.

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