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首页> 外文期刊>Plasma physics and controlled fusion >Removal of re-deposited layers and release of trapped hydrogen by He/O-ICR plasma in a HT-7 superconducting tokamak
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Removal of re-deposited layers and release of trapped hydrogen by He/O-ICR plasma in a HT-7 superconducting tokamak

机译:HT-7超导托卡马克中He / O-ICR等离子体去除再沉积层并释放捕获的氢

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Oxidation experiments by ion cyclotron resonance discharge in a gas mix of oxygen and helium (He/O-ICR) have been performed in a HT-7 in the presence of a permanent magnetic field of 1.5-2.0 T at wall temperatures of 400 to 470 K. Two kinds of gas mixture ratios of 4:1 and 1:1 (helium to oxygen) were used. With the same filling rate of oxygen, a higher pressure of He in the He/O-ICR plasma is beneficial for removal of co-deposition and reduces oxygen retention. For the same filling pressure, both the oxygen retention rate and the removal rate of H and C atoms during the He/O-ICR experiment were lower than that in the pure O-ICR experiment. The influence of ICR power and filling pressure on hydrogen and carbon removal rates was analysed. The highest removal rates of H and C atoms up to 5.4 x 10(21) atoms/h and 7.2 x 10(21) atoms/h, respectively, were obtained in 40 kW He/O-ICR cleaning with a ratio of He/O of 4:1 at 9.8 x 10(-2) Pa. By He-ICR cleanings and baking in helium gas, most oxygen retained on the wall was sufficiently removed before the subsequent plasma discharge. High power and high pressure He-ICRF cleanings are effective in removing the oxygen retained in the walls. Plasma discharges could be recovered after a few tens of disruptive plasma discharges.
机译:在HT-7中,在壁温为400至470的条件下,在存在1.5-2.0 T永久磁场的情况下,通过在氧气和氦气的混合气体(He / O-ICR)中进行离子回旋共振放电进行的氧化实验K.使用了4:1和1:1(氦气与氧气)的两种气体混合比。在相同的氧气填充速率下,He / O-ICR等离子体中较高的He压力有利于去除共沉积并减少氧气保留。对于相同的填充压力,He / O-ICR实验中的氧保留率以及H和C原子的去除率均低于纯O-ICR实验中的。分析了ICR功率和填充压力对氢和碳去除率的影响。在40 kW He / O-ICR清洗中,He / O的比率分别达到5.4 x 10(21)原子/ h和7.2 x 10(21)原子/ h的H和C原子的最高去除率在9.8 x 10(-2)Pa下为4:1的O。通过He-ICR清洁和氦气烘烤,在随后的等离子体放电之前,保留在壁上的大部分氧气已被充分清除。大功率和高压He-ICRF清洁剂可以有效清除壁上残留的氧气。几十次破坏性等离子体放电后,等离子体放电即可恢复。

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