首页> 外文期刊>Plant physiology >Transient proliferation of proanthocyanidin- accumulating cells on the epidermal apex contributes to highly aluminum-resistant root elongation in camphor tree
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Transient proliferation of proanthocyanidin- accumulating cells on the epidermal apex contributes to highly aluminum-resistant root elongation in camphor tree

机译:原花青素蓄积细胞在表皮顶部的瞬时增殖有助于樟脑树的高度耐铝根伸长

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摘要

Aluminum (Al) is a harmful element that rapidly inhibits the elongation of plant roots in acidic soils. The release of organic anions explains Al resistance in annual crops, but the mechanisms that are responsible for superior Al resistance in some woody plants remain unclear. We examined cell properties at the surface layer of the root apex in the camphor tree (Cinnamomum camphora) to understand its high Al resistance mechanism. Exposure to 500 μM Al for 8 d, more than 20-fold higher concentration and longer duration than what soybean (Glycine max) can tolerate, only reduced root elongation in the camphor tree to 64% of the control despite the slight induction of citrate release. In addition, Al content in the root apices was maintained at low levels. Histochemical profiling revealed that proanthocyanidin (PA)-accumulating cells were present at the adjacent outer layer of epidermis cells at the root apex, having distinctive zones for cell division and the early phase of cell expansion. Then the PA cells were gradually detached off the root, leaving thin debris behind, and the root surface was replaced with the elongating epidermis cells at the 3- to 4-mm region behind the tip. Al did not affect the proliferation of PA cells or epidermis cells, except for the delay in the start of expansion and the accelerated detachment of the former. In soybean roots, the innermost lateral root cap cells were absent in both PA accumulation and active cell division and failed to protect the epidermal cell expansion at 25 μM Al. These results suggest that transient proliferation and detachment of PA cells may facilitate the expansion of epidermis cells away from Al during root elongation in camphor tree.
机译:铝(Al)是一种有害元素,会迅速抑制酸性土壤中植物根系的伸长。有机阴离子的释放解释了一年生作物对铝的抗性,但尚不清楚导致某些木本植物具有较高铝抗性的机制。我们检查了樟树(Cinnamomum camphora)根尖表面层的细胞特性,以了解其高抗铝机理。暴露于500μMAl达8天,比大豆(Glycine max)所能忍受的浓度高20倍以上,持续时间更长,尽管略微诱导了柠檬酸盐的释放,但樟脑树的根部伸长率仅降低至对照的64% 。另外,根尖中的Al含量保持在低水平。组织化学分析显示,原花青素(PA)积累细胞存在于根尖表皮细胞的相邻外层,具有独特的细胞分裂区和细胞扩张的早期阶段。然后,PA细胞逐渐从根部脱离,在其后留下细小的碎片,并且根尖表面在尖端后3至4 mm的区域被伸长的表皮细胞代替。 A1不影响PA细胞或表皮细胞的增殖,除了前者的扩张开始延迟和加速脱离。在大豆根中,PA积累和活性细胞分裂均不存在最里面的侧根帽细胞,并且在25μMAl下不能保护表皮细胞膨胀。这些结果表明,在樟树的根伸长过程中,PA细胞的瞬时增殖和脱离可能促进表皮细胞从A1向远离A1的方向扩展。

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