首页> 外文期刊>Physical Review, B. Condensed Matter >SCANNING-TUNNELING-MICROSCOPY OBSERVATION OF STRESS-DRIVEN SURFACE DIFFUSION DUE TO LOCALIZED STRAIN FIELDS OF MISFIT DISLOCATIONS IN HETEROEPITAXY
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SCANNING-TUNNELING-MICROSCOPY OBSERVATION OF STRESS-DRIVEN SURFACE DIFFUSION DUE TO LOCALIZED STRAIN FIELDS OF MISFIT DISLOCATIONS IN HETEROEPITAXY

机译:异位错配错位的局部应变场引起的应力驱动表面扩散的扫描隧道显微镜观察

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摘要

Using in situ scanning-tunneling microscopy, the influence of localized strain fields of misfit dislocations on epitaxial growth is studied. We observe pronounced surface deformations caused by single dislocations and dislocation reactions, in excellent quantitative agreement with calculations based on elasticity theory. Due to the local reduction of strain energy at the surface above the interfacial dislocations, ridgelike structures are formed due to stress-driven surface diffusion during growth. [References: 22]
机译:使用原位扫描隧道显微镜,研究了错配位错的局部应变场对外延生长的影响。我们观察到由单一位错和位错反应引起的明显表面变形,与基于弹性理论的计算在极好的定量一致性方面。由于在界面位错上方的表面处的应变能的局部降低,由于生长过程中应力驱动的表面扩散,形成了脊状结构。 [参考:22]

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