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首页> 外文期刊>Physical Review, B. Condensed Matter >AB INITIO STUDY OF FULLY RELAXED DIVACANCIES IN GAAS
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AB INITIO STUDY OF FULLY RELAXED DIVACANCIES IN GAAS

机译:GAAS中完全放松的历程的从头算研究

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We report calculations of the electronic and atomic structures of neutral and charged divacancies in GaAs using the first-principles Car-Parrinello method. It is found that the divacancy relaxes inwards in all charge states (2-,1-,0,1+) studied. The defect-induced electron levels lie in the lower half of the fundamental band gap. The doubly negative divacancy is the most stable one for nearly all values of the electron chemical potential within the band gap. The deep-level electron density is localized at the Ga-vacancy end of the divacancy and the ionic relaxation is stronger there than at the As-vacancy end. We have also calculated the thermodynamic concentrations for several different native defects in GaAs, and the implications for selfdiffusion are discussed. [References: 29]
机译:我们报告使用第一性原理Car-Parrinello方法计算GaAs中性和带电空位的电子和原子结构的计算。发现在所有研究的电荷状态(2-,1-,0、1 +)中,空位向内松弛。缺陷诱发的电子能级位于基带隙的下半部分。对于带隙内几乎所有电子化学势的值,双负空位是最稳定的。深能级电子密度位于空位的Ga空位端,并且离子弛豫比As空位端强。我们还计算了GaAs中几种不同天然缺陷的热力学浓度,并讨论了自扩散的含义。 [参考:29]

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