机译:The Effect of Film Thickness on the Suitability of Titanium Oxynitride (TiN_xO_y, x + y = 1) Films as Heat Mirrors – Formed by the Atmospheric Pressure CVD of TiCl4 and NH_3
机译:Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimido-tris (diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
机译:Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimido-tris (diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
机译:The Effect of Film Thickness on the Suitability of Titanium Oxynitride (TiNxOy, x plus y=1) Films as Heat Mirrors-Formed by the Atmospheric Pressure CVD of TiCl4 and NH3