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Optical Microlithography XVI

召开年：2003
召开地：Santa Clara, CA(US)
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1.A 193 nm detector nonlinearity measurement system at NIST

机译：NIST的193 nm检测器非线性测量系统
- 作者：Shao Yang;Darryl Keenan;Holger Laabs;Maria Dowell
- 会议名称：《Optical Microlithography XVI》 | 2003年
- detector nonlinearity;
- ultraviolet laser detector calibration;
- ultraviolet laser metrology;
2.Deep-UV Liquid Immersion Mastering of High Density Optical Discs

机译：高密度光盘的深紫外液体浸入母版制作
- 作者：Helmar van Santen;Jaap H. M. Neijzen
- 会议名称：《Optical Microlithography XVI》 | 2003年
- liquid immersion;
- optical disc mastering;
- deep-UV;
3.Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist

机译：通过两光子吸收抗蚀剂以瑞利分辨率极限的一半进行光刻
- 作者：Hiromi Ezaki;Masato Shibuya
- 会议名称：《Optical Microlithography XVI》 | 2003年
4.Printing 95nm DRAM Full Chip Patterns in KrF Lithography

机译：在KrF光刻中印刷95nm DRAM全芯片图案
- 作者：Seok-Kyun Kim;Jin-Soo Kim;Tae-Jun Yoo;Keun-Kyu Kong;Hyoung-Soon Yun;Young-Deuk Kim;Hyoung-Ryeun Kim;Young-Sik Kim;Hyeongsoo Kim
- 会议名称：《Optical Microlithography XVI》 | 2003年
- 95nm printing;
- KrF lithography;
- crosspole illumination;
- DRAM full chip;
- 0.306 k_1;
5.Process latitude extension in low k_1 DRAM lithography using specific layer oriented illumination design

机译：使用特定的面向层的照明设计在低k_1 DRAM光刻中扩展工艺范围
- 作者：Young-Seog Kang;Dong-Seok Nam;Chan Hwang;Sang-Gyun Woo;Han-Ku Cho;Woo-Sung Han
- 会议名称：《Optical Microlithography XVI》 | 2003年
- RET;
- illumination;
- DRAM;
6.Comparison of vector theories for aerial image calculation

机译：航空影像计算的矢量理论比较
- 作者：Byoung-Sup Ahn;Sonny Y. Zinn;Seong-Woon Choi;Jung-Min Sohn
- 会议名称：《Optical Microlithography XVI》 | 2003年
- high-NA aerial image simulation;
- vector aerial image;
7.Development of an Organic Bottom Antireflective Coating for 157-nm Lithography

机译：用于157 nm光刻的有机底部抗反射涂层的开发
- 作者：Shigeo Irie;Masato Shigematsu;Seiro Miyoshi;Rikimaru Sakamoto;Kenichi Mizusawa;Yasuyuki Nakajima;Toshiro Itani
- 会议名称：《Optical Microlithography XVI》 | 2003年
- bottom-antireflective-coating;
- 157-nm lithography;
- optical constants;
- dry-etching rate;
- outgassing;
- resist pattern shape;
- fluorinated resist;
8.Excimer Lasers for Super-High NA 193 nm Lithography

机译：用于超高NA 193 nm光刻的准分子激光器
- 作者：Rainer Paetzel;Hans Stephan Albrecht;Peter Lokai;Wolfgang Zschocke;Thomas Schmidt;Igor Bragin;Thomas Schroeder;Christian Reusch;Stefan Spratte
- 会议名称：《Optical Microlithography XVI》 | 2003年
- excimer laser;
- optical microlithography;
- 193 nm;
- ultra-narrow line;
- high spectral purity;
9.Theoretical consideration on quantum lithography with conventional projection

机译：具有常规投影的量子光刻的理论考虑
- 作者：Toru Fujii;Naoki Fukutake;Hisao Osawa;Hiroshi Ooki
- 会议名称：《Optical Microlithography XVI》 | 2003年
- quantum lithography;
- biphoton absorption;
- double slit;
- fourier plane;
- image plane;
10.A New Lens Barrel Structure Utilized on the FPA-6000AS4 and its Contribution to the Lens Performance

机译：FPA-6000AS4上使用的新型镜筒结构及其对镜头性能的贡献
- 作者：Yuji Sudoh;Tsuneo Kanda
- 会议名称：《Optical Microlithography XVI》 | 2003年
11.Accelerated Damage to Blank and Antireflectance-coated CaF_2 surfaces under 157-nm Laser Irradiation

机译：在157 nm激光辐照下对空白和防反射涂层的CaF_2表面的加速损伤
- 作者：V. Liberman;M. Rothschild;S. T. Palmacci;N. N. Efremow;J. H. C. Sedlacek;A. Grenville
- 会议名称：《Optical Microlithography XVI》 | 2003年
12.ArF issues of 90nm node DRAM device integration

机译：90nm节点DRAM器件集成的ArF问题
- 作者：Doo-Hoon Goo;Byeong-Soo Kim;Joon-Soo Park;Kwang-Sub Yoon;Jung-Hyeon Lee;Han-Ku Cho;Woo-Sung Han;Joo-Tae Moon
- 会议名称：《Optical Microlithography XVI》 | 2003年
- ITRS roadmap;
- DRAM;
- KrF;
- ArF;
- low k1;
- optical;
13.Grating Analysis of Frequency Parsing Strategies for Imaging Interferometric Lithography

机译：成像干涉光刻的频率解析策略的光栅分析
- 作者：Eric S. Wu;Balu Santhanam;S. R. J. Brueck
- 会议名称：《Optical Microlithography XVI》 | 2003年
- imaging interferometric lithography;
- gratings;
- fourier analysis;
- MEEF;
- OPE;
14.High Power Excimer Lasers for 157 nm Lithography

机译：适用于157 nm光刻的高功率准分子激光器
- 作者：Stefan Spratte;Frank Voss;Igor Bragin;Elko Bergmann;Norbert Niemoeller;Tamas Nagy;Ulrich Rebhan;Andreas Targsdorf;Rainer Paetzel;Sergei Govorkov;Gongxue Hua
- 会议名称：《Optical Microlithography XVI》 | 2003年
- F_2-laser;
- 157 nm-emission;
- laser parameters;
- line selected;
- bandwidth;
- high repetition rate;
- high power;
- 157 nm metrology;
- excimer laser;
15.Impact of Attenuated Phase-shifting Mask for 157-nm Lithography with High Numerical Aperture Lens

机译：衰减相移掩模对高数值孔径透镜对157 nm光刻的影响
- 作者：Kunio Watanabe;Eiji Kurose;Toshifumi Suganaga;Toshiro Itani
- 会议名称：《Optical Microlithography XVI》 | 2003年
16.Measurement of the refractive index and thermo-optic coefficient of water near 193 nm

机译：193 nm附近水的折射率和热光系数的测量
- 作者：John H. Burnett;Simon Kaplan
- 会议名称：《Optical Microlithography XVI》 | 2003年
- index of refraction;
- refractive index;
- thermo-optic coefficient;
- 193 nm immersion lithography;
17.Resist footing variation and compensation over nonplanar wafer

机译：抵抗非平面晶圆的立足变化和补偿
- 作者：Takashi Sato;Ayako Endo;Kohji Hashimoto;Soichi Inoue;Tsuyoshi Shibata;Yuuji Kobayashi
- 会议名称：《Optical Microlithography XVI》 | 2003年
- DUV lithography;
- simulation;
- wafer topography;
- rigorous diffraction model;
- resist footing;
18.Spectral dynamics analysis of ultra-line-narrowed F_2 laser

机译：超窄线F_2激光器的光谱动力学分析
- 作者：Takahito Kumazaki;Osamu Wakabayashi;Ryoichi Nohdomi;Tatsuya Ariga;Hidenori Watanabe;Kazuaki Hotta;Hakaru Mizoguchi;Hiroki Tanaka;Akihiko Takahashi;Tatsuo Okada
- 会议名称：《Optical Microlithography XVI》 | 2003年
- F_2 laser;
- 157 nm microlithography;
- line-narrowing;
- injection locking;
- spectral bandwidth;
- numerical simulation;
- rate equation;
- photon transport equation;
- MOPA;
19.Sub 100nm DRAM cell patterning results and relation with lens aberration at 248nm lithography era

机译：248nm光刻时代低于100nm DRAM单元的图案化结果及其与透镜像差的关系
- 作者：Tae Jun You;Hyeong Soo Kim;Jin Soo Kim;Seok Kyun Kim;Young Deuk Kim;Hyeong Sun Youn;Keun Kyu Kong
- 会议名称：《Optical Microlithography XVI》 | 2003年
20.Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

机译：超线窄型ArF准分子激光G42A，用于产生90 nm以下的光刻
- 作者：Takashi Saito;Toru Suzuki;Masaya Yoshino;Osamu Wakabayashi;Takashi Matsunaga;Junichi Fujimoto;Kouji Kakizaki;Taku Yamazaki;Toyoharu Inoue;Katsutomo Terashima;Tatsuo Enami;Hirotoshi Inoue;Akira Sumitani;Hitoshi Tomaru;Hakaru Mizoguch
- 会议名称：《Optical Microlithography XVI》 | 2003年
- excimer laser;
- ArF;
- 193-nm;
- microlithography;
- line-narrowing;
- high repetition rate;
21.Validity of the Diffused Aerial Image Model: an Assessment Based on Multiple Test Cases

机译：航空影像扩散模型的有效性：基于多个测试案例的评估
- 作者：D. Fuard;M. Besacier;P. Schiavone
- 会议名称：《Optical Microlithography XVI》 | 2003年
- lithography simulation;
- simplified resist models;
- aerial image;
- CD prediction;
- gaussian noise;
- diffusion;
- OPC;
22.Boundary Layer Model to Account for Thick Mask Effects in Photolithography

机译：边界层模型以解决光刻中的厚掩模效应
- 作者：Jaione Tirapu-Azpiroz;Paul Burchard;Eli Yablonovitch
- 会议名称：《Optical Microlithography XVI》 | 2003年
23.Challenges of implementing 193nm lithography in printing sub-70nm line patterns for thin film heads

机译：在打印低于70nm的薄膜头线条图案中实施193nm光刻技术的挑战
- 作者：Chun-Ming Wang;Justin Hwu;Tim Minvielle
- 会议名称：《Optical Microlithography XVI》 | 2003年
- thin film heads (TFH);
- alternating phase shifting masks;
- ArF lithography;
- CD control;
- MRW;
24.Evaluating Scanner Lens Spherical Aberration Using Scatterometer

机译：使用散射仪评估扫描仪镜头球面像差
- 作者：Changan Wang;Gary Zhang;Colin Tan;Chris Atkinson;Mark Boehm;Jay Brown;David Godfrey;Mike Littau;Chris Raymond
- 会议名称：《Optical Microlithography XVI》 | 2003年
- spherical aberration;
- scatterometer;
- ACLV;
- scanner;
25.Tool ranking using aberration measurements in a high-volume manufacturing facility

机译：在大批量生产工厂中使用像差测量对工具进行排名
- 作者：Cesar M. Garza;Scott Warrick;Gary Seligman;Lena Zavyalova;Adrian Van Zwol;Jim Foster
- 会议名称：《Optical Microlithography XVI》 | 2003年
- optical microlithography;
- scanner;
- stepper;
- lens;
- aberration;
- zernike coefficients;
- tool cluster;
- ARTEMIS~(~R);
26.Web tool for worst-case assessment of aberration effects in printing a layout

机译：Web工具，用于在打印版面时最坏情况下评估像差效果
- 作者：Frank Gennari;Sachan Madahar;Andrew R. Neureuther
- 会议名称：《Optical Microlithography XVI》 | 2003年
- pattern matching;
- aberrations;
- web tool;
- testing layouts;
- simulation;
- projection printing;
27.Aberration Optimizing System Using Zernike Sensitivity Method

机译：Zernike灵敏度方法的像差优化系统
- 作者：Yasuo Shimizu;Tadashi Yamaguchi;Kousuke Suzuki;Yuji Shiba;Tomoyuki Matsuyama;Shigeru Hirukawa
- 会议名称：《Optical Microlithography XVI》 | 2003年
- projection lens;
- wavefront aberration;
- zernike polynomials;
- zernike sensitivity;
- imaging performance;
- optimization;
28.Domain decomposition methods for simulation of printing and inspection of phase defects

机译：模拟打印和检查相缺陷的域分解方法
- 作者：Michael Lam;Kostas Adam;Andy Neureuther
- 会议名称：《Optical Microlithography XVI》 | 2003年
- lithography;
- domain decomposition;
- defect projector;
- defect printability;
- phase defects;
29.Dual-chamber ultra line-narrowed excimer light source for 193 nm lithography

机译：适用于193 nm光刻的双室超窄行准分子光源
- 作者：V.B. Fleurov;D.J. Colon III;D.J.W. Brown;P. OKeeffe;H. Besaucele;A.I. Ershov;F.Trinchouk;T. Ishihara;P. Zambon;R. Rafac;A. Lukashev
- 会议名称：《Optical Microlithography XVI》 | 2003年
- excimer laser;
- 193nm light source;
- narrow bandwidth;
- MOPA;
- DUV;
- microlithography;
30.Stage accuracy results using interferometers compensated for refractivity fluctuations

机译：使用补偿了折射率波动的干涉仪进行平台精度结果
- 作者：Philip D. Henshaw;Pierre Trepagnier;Robert Dillon;Wouter Pril;Bas Hultermans
- 会议名称：《Optical Microlithography XVI》 | 2003年
- stage accuracy;
- overlay;
- air refractivity;
- air turbulence;
- air pressure;
31.Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography

机译：用于157 nm光刻的底部抗反射涂层（BARC）
- 作者：Liu He;Rama Puligadda;Joyce Lowes;Michael Rich
- 会议名称：《Optical Microlithography XVI》 | 2003年
- 157-nm;
- BARC;
- anti-reflective coating;
- lithography;
32.Comparative Study of Chromeless and Attenuated Phase Shift Mask for 0.3 k1 ArF Lithography of DRAM

机译：0.3 k1 ArF DRAM光刻的无铬和衰减相移掩模的比较研究
- 作者：Tae-Seung Eom;Chang-Moon Lim;Seo-Min Kim;Hee-Bom Kim;Se-Young Oh;Won-Kwang Ma;Seung-Chan Moon;Ki-Soo Shin
- 会议名称：《Optical Microlithography XVI》 | 2003年
- phase shift mask;
- chrome-less mask;
- attenuated PSM;
- ArF;
- k1;
33.Evaluation of various pitches 100-nm contact holes applying IDEALSmile with high NA KrF scanner

机译：使用IDEALSmile和高NA KrF扫描仪评估各种间距100 nm的接触孔
- 作者：Takeaki (Joe) Ebihara;Toshihiro (Tommy) Oga
- 会议名称：《Optical Microlithography XVI》 | 2003年
- contact;
- VIA;
- IDEAL;
- IDEALSmile;
- resolution enhancement technology;
34.Evaluation of Zernike sensitivity method for CD distribution

机译：Zernike敏感度分布CD方法的评估
- 作者：Toshiharu Nakashima;Steven D. Slonaker;Takehito Kudo;Shigeru Hirukawa
- 会议名称：《Optical Microlithography XVI》 | 2003年
- wavefront aberration;
- zernike sensitivity method;
- CD distribution;
- defocus;
- CD-focus;
- response surface;
35.Image-blur tolerances for 65nm and 45nm-node IC manufacturing

机译：65nm和45nm节点IC制造的图像模糊容限
- 作者：Ivan Lalovic;Armen Kroyan;Jongwook Kye;Hua-Yu Liu;Harry J. Levinson
- 会议名称：《Optical Microlithography XVI》 | 2003年
- 193nm and 157nm lithography;
- scanning optics;
- image blur;
- fading;
- contrast;
- stage synchronization error;
36.Overcoming the Resolution Challenge Using Special Illumination Techniques to Print 50/50 nm Nested Contact Holes at 157 nm Wavelength

机译：使用特殊的照明技术克服挑战性，在157 nm波长下打印50/50 nm嵌套接触孔的分辨率挑战
- 作者：Nabila Baba-Ali;Harry Sewell;Justin Kreuzer
- 会议名称：《Optical Microlithography XVI》 | 2003年
- contact holes;
- 157 nm;
- polarization;
- chromeless alternating PSM (CAPSM);
- attenuating PSM;
- phase checkerboard;
- high NA;
- immersion lithography;
- aerial image;
- resist image;
37.Simulation Study of Process Latitude for Liquid Immersion Lithography

机译：液体浸没光刻工艺自由度的模拟研究
- 作者：So-Yeon Baek;Daniel C. Cole;Mordechai Rothschild;Michael Switkes;Michael S.Yeung;Eytan Barouch
- 会议名称：《Optical Microlithography XVI》 | 2003年
38.Compaction and Rarefaction of Fused Silica with 193-nm Excimer Laser Exposure

机译：193 nm受激准分子激光对熔融石英的压实和反射
- 作者：J. Martin Algots;Richard Sandstrom;William Partlo;Petar Maroevic;Eric Eva;Michael Gerhard;Ralf Lindner;Frank Stietz
- 会议名称：《Optical Microlithography XVI》 | 2003年
- lithography;
- excimer;
- ArF;
- fused silica;
- compaction;
- rarefaction;
- pulse stretch;
39.Dipole Options for 90nm Lithography Technologies and Below

机译：90nm及以下光刻技术的偶极选件
- 作者：Gek Soon Chua;Cho Jui Tay;Chenggen Quan;Qunying Lin;Leng Hai Chua
- 会议名称：《Optical Microlithography XVI》 | 2003年
- dipole illumination;
- diffraction orders;
- 193nm lithography;
- 90nm equal lines and spaces;
- RETs;
40.Experimental assessment of pattern and probe-based aberration monitors

机译：基于模式和探头的像差监视器的实验评估
- 作者：Garth C. Robins;Andrew R. Neureuther
- 会议名称：《Optical Microlithography XVI》 | 2003年
41.High-Performance Beam Stabilization for Next-Generation ArF Beam Delivery Systems

机译：下一代ArF光束传输系统的高性能光束稳定
- 作者：Leonard Lublin;David Warkentin;Palash P. Das;Alexander I. Ershov;Jody Vipperman;Ronald L. Spangler;Brian Klene
- 会议名称：《Optical Microlithography XVI》 | 2003年
- beam stabilization;
- lithography;
- beam delivery;
42.Process Sensitivity and Optimization with Full and Simplified Resist Models

机译：使用完整和简化的电阻模型进行过程敏感性和优化
- 作者：Mark D. Smith;Chris A. Mack
- 会议名称：《Optical Microlithography XVI》 | 2003年
- photoresist modeling;
- aerial image threshold model;
- lumped parameter model;
- LPM;
- lithography simulation;
- PROLITH;
43.Pupil-fill imperfections and their effect on lithography

机译：瞳孔填充缺陷及其对光刻的影响
- 作者：Stephen P. Renwick;Steven D. Slonaker
- 会议名称：《Optical Microlithography XVI》 | 2003年
- pupilgram;
- pupil fill;
- illuminator;
- uniformity;
- sigma;
- partial coherence;
- CD control;
- HV bias;
44.Scattering losses in fused silica and CaF_2 for DUV applications

机译：用于DUV应用的熔融石英和CaF_2中的散射损耗
- 作者：Stephan Logunov;Sergey Kuchinsky
- 会议名称：《Optical Microlithography XVI》 | 2003年
45.Simulation Benchmarking

机译：模拟基准
- 作者：J. K. Tyminski;T. Nakashima;T. Kudo;S. Slonaker;S. Hirukawa
- 会议名称：《Optical Microlithography XVI》 | 2003年
46.Wavefront Aberration Measurement in 157-nm High Numerical Aperture Lens

机译：157 nm高数值孔径镜头的波前像差测量
- 作者：Jae-Hwan KIM;Toshifumi Suganaga;Kunio Watanabe;Noriyoshi Kanda;Toshiro Itani;Julian Cashmore;Malcolm Gower
- 会议名称：《Optical Microlithography XVI》 | 2003年
- 157-nm lithography;
- high NA lens;
- aberration;
- flare;
- microstepper;
47.Zero MEF Hole Formation with Atten-PSM and Modified Illumination

机译：使用Atten-PSM和改进的照明实现零MEF孔形成
- 作者：Shuji Nakao;Tadashi Miyagi;Shinji Tarutani;Shigenori Yamashita;Jyunji Miyazaki;Hidehiko Kozawa;Akira Tokui;Kouichirou Tsujita
- 会议名称：《Optical Microlithography XVI》 | 2003年
- tone reversed image;
- atten-PSM;
- Cr-less PSM;
- modified illumination;
- cross-pole illumination;
- zero MEF;
- iso-focal CD characteristics;
48.Outlier Rejection with Mixture Models in Alignment'

机译：对齐中具有混合模型的离群值剔除
- 作者：Shinichi Nakajima;Yuho Kanaya;Mengling Li;Taro Sugihara;Ayako Sukegawa;Nobutaka Magome
- 会议名称：《Optical Microlithography XVI》 | 2003年
- mixture models;
- maximum penalized likelihood;
- information criterion;
- likelihood ratio test;
- alignment;
49.Practical Resist Model Calibration

机译：实用抵抗模型校准
- 作者：Pary Baluswamy;Amy Weatherly;Dave Kewley;Peter Brooker;Mike Pauzer
- 会议名称：《Optical Microlithography XVI》 | 2003年
- resist model;
- calibration;
- positive chemically amplified resist;
- FIRM;
- SOLID-C;
50.Monolithic Detector Array Comprised of >1000 Aerial Image Sensing Elements

机译：单片探测器阵列，包括> 1000个航空影像传感元件
- 作者：R. R. Kunz;D. D. Rathman;S. J. Spector;M. Yeung
- 会议名称：《Optical Microlithography XVI》 | 2003年
- photodiode;
- photodetector;
- aberration monitor;
- aerial image;
- polarization sensing;
51.New Concerns with the Design of Filters for the Protection of Lithography Optics

机译：保护光刻光学的滤光片设计的新问题
- 作者：Andrew J. Dallas;William Ding;Brian Hoang;Jon Joriman;Jonathan Parsons;Kevin Seguin
- 会议名称：《Optical Microlithography XVI》 | 2003年
- filter;
- point-of-use;
- contamination control;
- airborne molecular contamination;
- AMC;
- optics protection;
- lens contamination;
- lens hazing;
- humidity;
- chemical filtration;
52.Programmable Lithography Engine, ProLE~(TM), Grid-Type Supercomputer and Its Applications

机译：可编程光刻引擎，ProLE〜（TM），网格型超级计算机及其应用
- 作者：John S. Petersen;Mark John Maslow;David J. Gerold;Robert T. Greenway
- 会议名称：《Optical Microlithography XVI》 | 2003年
- lithography;
- simulation;
- EDA;
- TCAD;
- RET;
- yield;
- systematic failure;
- DFM;
- PSM;
- GRID computing;