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Development of a multifunctional nanoindenter integrated in-situ Scanning Electron Microscope - application to the monitoring of piezoresponse and electro-mechanical failures

机译:开发多功能纳米丁内德集成的原位扫描电子显微镜 - 用于监测压电响应和机电故障的应用

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The rising complexity of multi-material structures integrated into multi-functional devices requires the development of dedicated characterization tools capable of simultaneously monitoring different physical magnitudes with a relevant spatial resolution. This paper reports the development and the application of an original instrument based on a nanoindenter coupled with fine electrical measurements and integrated in-situ a Scanning Electron Microscope (SEM). The performances and capabilities of this home-developed instrument are illustrated through two different case studies.First, a micrometer-scale piezoelectric structure made up of wurtzite-single crystalline AlN islands grown on top of conductive Si pillars is tested. In-situ SEM imaging is used to precisely position the indenting probe on these individual islands, while the instrument sensitivity and repeatability are used to monitor their low-signal piezoresponse. Effective piezoelectric coefficients are also extracted for different loading/unloading conditions.Secondly a Si3N4/AlSiCu/SiO2 stack, which is standardly integrated as a passivation structure on top of microelectronic chips, is electrically and mechanically stressed and monitored up to its failure. The mechanical failure mechanisms (buried or emerging cracks) are discriminated thanks to the real-time SEM imaging of the indentation test. The instrument high sensitivity is used to monitor early current leakages that are attributed to conduction paths induced by mechanical failures.Combining high electro-mechanical sensitivity and precise probe positioning appears as an efficient way to monitor and analyze low-level electrical responses of small-scale structures. This approach paves the way to the fine characterization of micro/nano-systems displaying mechanically-driven electrical properties (conduction mechanism, leakage, breakdown,) like 2D-materials, dielectrics in microelectronic devices, strain-sensors, enamelled Litz wires,...
机译:集成到多功能设备中的多重材料结构的复杂性需要开发能够同时监视具有相关空间分辨率的不同物理幅度的专用表征工具。本文报告了基于纳米印线的原始仪器的开发和应用耦合,与精细电气测量并集成到原位扫描电子显微镜(SEM)。通过两种不同的案例研究说明了该仪器的性能和能力。首先,测试了由在导电Si支柱顶部生长的耐纯度单晶ALN岛组成的微米级压电结构。原位SEM成像用于精确地将缩进探头定位在这些单独的岛上,而仪器敏感性和重复性用于监测其低信号压电响应。还针对不同的装载/卸载条件提取有效的压电系数。第二种Si3N4 / Alsicu / SiO2叠层,其被标准地作为微电子芯片上的钝化结构集成,电动和机械地应力并监测到其故障。由于压痕试验的实时SEM成像,歧视机械故障机制(埋地或出现的裂缝)。仪器高灵敏度用于监测由机械故障引起的导电路径的早期电流泄漏..高机电灵敏度和精确的探针定位看起来作为监测和分析小规模低级电反应的有效方法结构。这种方法铺设了微/纳米系统的精细表征的方式,显示了机械驱动的电气性能(导通机构,泄漏,击穿),如2D材料,微电子器件中的电介质,应变传感器,搪瓷丝光线,... 。

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