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Thickness dependence of structure and optical properties of silver films deposited by magnetron sputtering

机译:磁控溅射沉积银膜的结构和光学性能的厚度依赖性

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摘要

A series of silver films with different thickness were prepared under identical conditions by direct current magnetron sputtering. The optical properties of the silver films were measured using spectrophotometric techniques and the optical constants were calculated from reflection and transmission measurements made at near normal incidence. The results show that the optical properties and constants are affected by films' thickness. Below the critical thickness of 17 nm at which Ag film forms a continuous film, the optical properties and constants vary significantly as the thickness of films increases and then tends to a stable value which is reached at 41 nm. X-ray diffraction measurements were carried out to examine the structure and stress evolution of the Ag films as a function of films' thickness. It was found that the interplanar distance of (111) orientation decreases when the film thickness increases and tends to be close to that of bulk material. The compressive strains also decrease with increasing thickness.
机译:通过直流磁控溅射在相同条件下制备了一系列厚度不同的银膜。使用分光光度法测量银膜的光学性能,并根据接近法线入射的反射率和透射率测量值计算光学常数。结果表明,光学性能和常数受薄膜厚度的影响。低于Ag膜形成连续膜的17 nm临界厚度时,光学性能和常数会随着膜厚度的增加而显着变化,然后趋于达到41 nm处的稳定值。进行X射线衍射测量以检查Ag膜的结构和应力演变与膜厚度的关系。已经发现,当膜厚度增加时,(111)取向的平面间距离减小,并且趋向于接近块状材料。压缩应变也随着厚度的增加而减小。

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