...
首页> 外文期刊>Thin Solid Films >Hydrogen isotope sputtering of graphite by molecular dynamics simulation
【24h】

Hydrogen isotope sputtering of graphite by molecular dynamics simulation

机译:分子动力学模拟石墨的氢同位素溅射。

获取原文
获取原文并翻译 | 示例
           

摘要

We used a molecular dynamics simulation with the modified Brenner reactive empirical bond order potential to investigate the erosion of a graphite surface due to the incidence of hydrogen, deuterium, and tritium atoms. Incident particles cause pressure on the graphite surface, and the chemical bond between graphene layers then generates heat to erode the graphite surface. We evaluated the speed of surface destruction by calculating the pseudo-radial distribution function. The speed of surface destruction due to incident hydrogen isotopes was higher than that due to hydrogen atoms. The surface destruction increased exponentially and its decay time constant was a power function of the incident energy. We measured the erosion yield, which indicated a steady state for the graphite erosion. The erosion yield flux in the steady state increased linearly with the incident energy. The erosion yield flux was almost independent of the type of incident particle, and the erosion yield start time was smaller for hydrogen isotopes than for hydrogen atoms.
机译:我们使用分子动力学模拟和改进的布伦纳反应性经验键序势来研究由于氢,氘和tri原子的发生而对石墨表面的腐蚀。入射粒子在石墨表面上产生压力,石墨烯层之间的化学键随后产生热量以腐蚀石墨表面。我们通过计算伪径向分布函数评估了表面破坏的速度。入射氢同位素引起的表面破坏速度高于氢原子引起的表面破坏速度。表面破坏呈指数增长,其衰减时间常数是入射能量的幂函数。我们测量了腐蚀率,这表明石墨腐蚀处于稳定状态。稳态下的腐蚀屈服通量随入射能量线性增加。腐蚀产生通量几乎与入射粒子的类型无关,并且氢同位素的腐蚀产生开始时间比氢原子短。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号