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首页> 外文期刊>Thin Solid Films >Steady state and transient photoconductivity measurements in a-Se_(90-x)Sb_(10)In_x thin films
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Steady state and transient photoconductivity measurements in a-Se_(90-x)Sb_(10)In_x thin films

机译:a-Se_(90-x)Sb_(10)In_x薄膜的稳态和瞬态光电导率测量

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摘要

Amorphous thin films of Se_(90-x)Sb_(10)In_x (0≤x≤15) have been prepared by electron beam evaporation method. The steady state and transient photoconductivity measurements on the thin films of Se_(90-x)Sb_(10)In_x (0≤x≤15) were carried out at different levels of light intensities (500 lx-5000 lx) at room temperature (301 K). The plot of photocurrent (I_(ph)) versus light intensity (F) follows a power law I_(ph)∞F~γ. The value of exponent y lies between 0.5 and 1.0, which indicates there exists a continuous distribution of localized states in the mobility gap of Se_(90-x)Sb_(10)In_x (0≤x≤15) thin films. For transient photoconductivity, when the samples were illuminated with light, the photocurrent reaches the maximum value during the first 5 s of exposure time and thereafter, it starts decreasing and becomes stable after 15 min of exposure. This kind of phenomenon is termed as photo-degradation of photocurrent. The results have been explained on the basis of charged defect model and the intercluster interaction model. The magnitude of photocurrent of the system α-Se_(75)Sb_(10)In_(15) is higher than the parent system α-Se_(90)Sb_(10). The photosensitivity shows a minimum value at 5 atomic percentage of indium (In) concentration, which is explained based on chemically ordered network model and the topological model.
机译:通过电子束蒸发法制备了Se_(90-x)Sb_(10)In_x(0≤x≤15)非晶态薄膜。在室温(500 lx-5000 lx)的不同光强度水平下,对Se_(90-x)Sb_(10)In_x(0≤x≤15)薄膜进行稳态和瞬态光电导测量( 301 K)。光电流(I_(ph))对光强度(F)的曲线遵循幂定律I_(ph)∞F〜γ。指数y的值在0.5到1.0之间,这表明Se_(90-x)Sb_(10)In_x(0≤x≤15)薄膜的迁移率间隙中存在局部态的连续分布。对于瞬态光电导性,当样品用光照射时,光电流在曝光时间的前5 s达到最大值,此后,它开始减小并在曝光15分钟后变得稳定。这种现象称为光电流的光降解。基于带电缺陷模型和集群间交互模型对结果进行了解释。系统α-Se_(75)Sb_(10)In_(15)的光电流大小高于父系统α-Se_(90)Sb_(10)。光敏度显示铟(In)浓度为5原子百分数时的最小值,这是根据化学有序网络模型和拓扑模型进行解释的。

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