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Ferroelectric properties of the organic films of poly(vinylidene fluoride-trifluoroethylene blended with inorganic Pb(Zr, Ti)O_3

机译:聚偏二氟乙烯-三氟乙烯与无机Pb(Zr,Ti)O_3共混的有机薄膜的铁电性能

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摘要

Precursor films based on poly(vinylidene fluoride-trifluoroethylene) P(VDF-TrFE) and P(VDF-TrFE) blended with Pb(Zr,Ti)O_3 were spin-coated on Si-substrates and subsequently annealed at 170 ℃. X-ray diffraction studies showed that the amorphous precursor films crystallize to the 7-phase P(VDF-TrFE) without involving the formation of other polymorphs when the P(VDF-TrFE) is blended with Pb(Zr,Ti)O_3, resulting in phase mixtures composed of a crystalline γ-phase P(VDF-TrFE) and an amorphous Pb(Zr,Ti)O_3. A larger memory window width and higher accumulation capacitance, as well as a lower leakage current density are induced by the blended Pb(Zr,Ti)O_3 within the low operating voltage ranges from -3.0 to 3.0 V and from -2.0 to 2.0 V for 20 wt% and 40 wt% Pb(Zr,Ti)O_3 blending, respectively. These improvements not only in the hyster-etic capacitance-voltage characteristics but also in the leakage current density-electric field are directly correlated with the phase mixtures, their volume fraction, dipole moments, and formation of interface layer between the blended film and Si substrate.
机译:将聚偏二氟乙烯-三氟乙烯P(VDF-TrFE)和P(VDF-TrFE)与Pb(Zr,Ti)O_3共混的前体薄膜旋涂在Si衬底上,然后在170℃下退火。 X射线衍射研究表明,当P(VDF-TrFE)与Pb(Zr,Ti)O_3共混时,非晶态前体膜结晶为7相P(VDF-TrFE),而没有形成其他多晶型物,在由晶态γ相P(VDF-TrFE)和非晶态Pb(Zr,Ti)O_3组成的相混合物中。在-3.0至3.0 V和-2.0至2.0 V的低工作电压范围内,混合的Pb(Zr,Ti)O_3会引起较大的存储窗口宽度和较高的累积电容,以及较低的泄漏电流密度。分别掺入20 wt%和40 wt%的Pb(Zr,Ti)O_3。这些改进不仅在滞后电容-电压特性上,而且在漏电流密度-电场上都与相混合物,其体积分数,偶极矩以及共混膜与Si衬底之间的界面层的形成直接相关。 。

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