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Adsorption of NH3 on oxygen pre-treated Ni(111)

机译:NH3在氧气预处理的Ni(111)上的吸附

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The adsorption of NH3 on oxygen pre-treated Ni(111) surfaces has been studied at room temperature using X-ray photoelectron spectroscopy (XPS). Oxygen pre-treatments have been performed at 650 K. This protocol leads to a "two-phase domain" (O-adsorbed phase + NiO islands) over a large range of oxygen exposures. The investigation of the surface reactivity towards NH3 shows that ammonia is adsorbed provided that the O-adsorbed phase is present; the surface reactivity increases with the O-adsorbed phase coverage. Two N-adspecies have been detected from the N 1s core level peaks at 399.8+/-0.2 and 397.8+/-0.2 eV and assigned to molecular NH3 and dissociated NH2 species, respectively. The molecular adsorption results from direct impingement of the NH3 molecules, whereas the dissociated one results from the dissociation of a part of the preadsorbed molecular species. At saturation, the dissociated species is the more abundant one (about 4/5 of the total N 1s peak) whatever the initial coverage (>0) of the surface by the O-adsorbed phase. The XPS data indicate that this dissociation is correlated to the formation of OH from oxygen of the adsorbed phase and hydrogen abstraction from the molecular ammonia. When the O-adsorbed phase is absent on the surface, i.e. for clean Ni(111) or the complete NiO layer, none of these surface reactions with ammonia occurs, under the same adsorption conditions. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 56]
机译:NH 3在氧预处理的Ni(111)表面上的吸附已在室温下使用X射线光电子能谱(XPS)进行了研究。氧气预处理已在650 K下进行。该协议可在较大范围的氧气暴露下形成“两相域”(O吸附相+ NiO岛)。对NH3的表面反应性的研究表明,只要存在O吸附相,就会吸附氨。表面反应性随O吸附相覆盖率的增加而增加。从399.8 +/- 0.2和397.8 +/- 0.2 eV的N 1s核心能级峰中检测到两个N-种,分别分配给分子NH3和离解的NH2。分子吸附是由于NH3分子的直接撞击而引起的,而离解的是由于一部分预吸附分子种类的离解而引起的。处于饱和状态时,无论被O吸附相覆盖的表面初始覆盖率(> 0)如何,离解的物种都是更丰富的物种(约占总N 1s峰的4/5)。 XPS数据表明这种解离与吸附相中氧的OH的形成和分子氨中氢的提取有关。当表面上没有O吸附相时,即对于干净的Ni(111)或完整的NiO层,在相同的吸附条件下,这些与氨的表面反应均不会发生。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:56]

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