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Exploring the mechanism of NO-C_2H_4 reactions on the surface of stepped Pt(332)

机译:探索阶梯状Pt(332)表面NO-C_2H_4反应的机理

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Fourier transform infra red reflection-absorption spectroscopy (FTIR-RAS), thermal desorption spectros-copy (TDS), and Auger electron spectroscopy (AES), were employed to explore the mechanism of NO reduction in the presence of C_2H_4 on the surface of stepped Pt(332). Both NO-Pt and C_2H_4-Pt interactions are enhanced when NO and C_2H_4 are co-adsorbed on Pt(332). As a result, C_2H_4 is dissociated at surface temperatures as low as 150 K, and the N-0 stretch band is weakened. The presence of post-exposed C_2H_4 leads NO desorption from steps to decrease significantly, but the same effect on NO desorption from terraces becomes appreciable only at higher post-exposures of C_2H_4, e.g., 0.6 L and 1.2 L, and proceeds to a much slighter extent. Auger spectra indicate that as a result of the reaction with O from NO dissociation, the amount of surface C species is greatly reduced when NO is post-exposed to a C_2H_4 adlayer. It is concluded that reduction of NO in the presence of C_2H_4 proceeds very effectively on the surface of the Pt(332), through a mechanism of NO dissociation and subsequent O removal. Following this mechanism, the significant dissociation of adsorbed NO molecules on steps at surface temperatures below 400 K, and subsequent rapid reaction between the resultant O and C-related species, accounts for the considerable amount of N_2 desorption at temperatures below 400 K.
机译:利用傅里叶变换红外反射吸收光谱(FTIR-RAS),热脱附光谱(TDS)和俄歇电子能谱(AES)探索阶梯表面上存在C_2H_4时NO还原的机理点(332)。当NO和C_2H_4共吸附在Pt上时,NO-Pt和C_2H_4-Pt相互作用都会增强(332)。结果,C_2H_4在低至150 K的表面温度下解离,并且N-0拉伸带变弱。暴露后的C_2H_4的存在会导致NO的阶跃解吸显着减少,但仅在更高的C_2H_4的后暴露(例如0.6 L和1.2 L)下,阶跃NO的解吸的相同影响才变得明显。程度。俄歇光谱表明,由于NO离解而与O反应,当NO后暴露于C_2H_4吸附层时,表面C物种的数量大大减少。结论是,通过NO分解和随后的O去除机理,在C_2H_4存在下,NO的还原非常有效地在Pt(332)的表面上进行。遵循此机制,在低于400 K的表面温度下,台阶上吸附的NO分子发生明显解离,随后生成的O和C相关物质之间迅速反应,这说明在低于400 K的温度下有大量N_2解吸。

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