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Electron confinement in an STM-lithographed nanoscale domain on an Si(111)3~(1/2) × 3~(1/2)-Ag surface at room temperature

机译:在室温下,在Si(111)3〜(1/2)×3〜(1/2)-Ag表面上将电子限制在STM刻蚀的纳米级域中

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摘要

We demonstrate that scanning-tunneling microscope (STM) lithography on Si(111)3~(1/2) × 3~(1/2)-Ag surfaces enables us to fabricate two-dimensional (2D) quantum nanostructures that are stable at room temperature. A 20 nm structure was successfully drawn by applying a high bias voltage to the STM tip. Confinement of electrons in a two-dimensional free-electron-like S_1 surface band was confirmed by observing standing-wave patterns in the lithographed closed loop at room temperature. The patterns were compared with numerically calculated ones using a finite-element method (FEM) code.
机译:我们证明了在Si(111)3〜(1/2)×3〜(1/2)-Ag表面上的扫描隧道显微镜(STM)光刻技术使我们能够制造在(室内温度。通过向STM尖端施加高偏置电压成功绘制了20 nm结构。通过在室温下在平版印刷的闭环中观察驻波图,可以确认电子被限制在二维自由电子状S_1表面带中。使用有限元方法(FEM)代码将这些模式与数值计算的模式进行比较。

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