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Stability of nitrogen incorporated Al_2O_3 surfaces: Formation of A1N layers by oxygen desorption

机译:掺氮的Al_2O_3表面的稳定性:通过氧解吸形成AlN层

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摘要

The incorporation of nitrogen on Al_2O_3(0001) and (1102) surfaces is theoretically investigated on the basis of total-energy electronic-structure calculations within the density functional theory. The calculated surface energies as functions of oxygen and nitrogen chemical potentials reveal that under pregrowth conditions the O atoms of Al_2O_3 surfaces can be replaced by N atoms. Moreover, we find that the outermost 0 atoms tend to desorb from the surface and A1N layers are consequently formed on Al_2O_3 surfaces. This im plies that the desorption of oxygen is crucial for the nitridation process. The structures of nitrogen incorpo rated Al_2O_3 surfaces obtained in the present study are consistent with those observed in the experiments.
机译:在密度泛函理论内,基于总能电子结构计算,理论上研究了氮在Al_2O_3(0001)和(1102)表面上的结合。计算得出的表面能作为氧和氮化学势的函数表明,在预生长条件下,Al_2O_3表面的O原子可以被N原子取代。此外,我们发现最外层的0个原子倾向于从表面脱附,因此在Al_2O_3表面上形成了AlN层。这意味着氧气的解吸对于氮化过程至关重要。在本研究中获得的氮结合定额Al_2O_3表面的结构与实验中观察到的结构一致。

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