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3C-SiC(001 )-3 × 2 reconstructed surface analyzed by high-resolution medium energy ion scattering

机译:高分辨率介质能量离子散射分析3C-SiC(001)-3×2重构表面

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摘要

The atomic structure of the 3C-SiC(001)-3×2 reconstructed surface was analyzed precisely by high-resolution medium energy ion scattering (MEIS). The present MEIS analysis unambiguously shows that the (3×2) surface consists of Si adatoms (1/3 ML, 1 ML=1.05×l0~(15)atoms/cm~2) on top and underlying Si adlayer (2/3 ML) on the bulk truncated Si plane. As the result, the most probable structure is focused on the Two Adlayer Asymmetric Dimer Model predicted by ab initio calculations and the modified versions with alternating long and short dimers in the 2nd adlayer proposed by photoelectron diffraction (PED) and by grazing incidence X-ray diffraction (GIXRD) analyses. Observed MEIS spectra are well reproduced by the structure relatively close to that determined by PED rather than GIXRD. Interestingly, the first principle calculations using VASP (Vienna ab initio simulation package) prefer symmetric dimers in the second Si adlayer and non-relaxed interplanar distance between the top Si and 2nd C plane of the bulk-truncated surface, which are, however, unable to reproduce the observed MEIS spectra. The distorted 2nd adlayer (asymmetric dimers) may correlate with the compressed interplanar distance between the underlying Si and C planes.
机译:通过高分辨率介质能量离子散射(MEIS)精确分析了3C-SiC(001)-3×2重建表面的原子结构。目前的MEIS分析清楚地表明,(3×2)表面由顶部和下方的Si吸附层(2/3)上的Si吸附原子(1/3 ML,1 ML = 1.05×10〜(15)atoms / cm〜2)组成ML)在大体截断的Si平面上。结果,最可能的结构集中在通过从头算计算预测的两层不对称二聚体模型上,以及通过光电子衍射(PED)和掠入射X射线提出的第二层中长短交替的二聚体的改进版本衍射(GIXRD)分析。观察到的MEIS光谱通过与PED而非GIXRD所确定的结构相对接近的结构很好地再现。有趣的是,使用VASP(维也纳从头算起,模拟程序包)进行的第一原理计算更喜欢第二Si附加层中的对称二聚体以及本体截顶表面的顶部Si与第二C平面之间的非松弛平面间距,但是这无法实现重现观察到的MEIS光谱。变形的第二添加层(不对称二聚体)可能与下面的Si和C平面之间的压缩平面间距相关。

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  • 来源
    《Surface Science》 |2012年第24期|p.1942-1947|共6页
  • 作者单位

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

    Department of Physics, Ritsumeikan University, Kusatsu, Shiga-ken 525-8577, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    3C-SiC(001)-3×2 surface; medium energy ion scattering (MEIS); Ab initio calculations;

    机译:3C-SiC(001)-3×2表面;中能离子散射(MEIS);从头算;
  • 入库时间 2022-08-18 03:05:16

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