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Effect of different dopant elements (Al, Mg and Ni) on microstructural, optical and electrochemical properties of ZnO thin films deposited by spray pyrolysis (SP)

机译:不同掺杂元素(Al,Mg和Ni)对喷雾热解(SP)沉积ZnO薄膜的微观结构,光学和电化学性能的影响

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In the present work we studied the influence of the dopant elements and concentration on the microstructural and electrochemical properties of ZnO thin films deposited by spray pyrolysis. Transparent conductive thin films of zinc oxide (ZnO) were prepared by the spray pyrolysis process using an aqueous solution of zinc acetate dehydrate izn(CH_3COO)_2·2H_2O] on soda glass substrate heated at 400 ± 5 ℃. A1C1_3, MgCl_2 and NiCl_2 were used as dopant. The effect of doping percentage (2-4%) has been investigated. Afterwards the samples were thermally annealed in an ambient air during one hour at 500 ℃. X-ray diffraction showed that films have a wurtzite structure with a preferential orientation along the (002) direction for doped ZnO. The lattice parameters a and c are estimated to be 3.24 and 5.20 A, respectively. Transmission allowed to estimate the band gaps of ZnO layers. The electrochemical studies revealed that the corrosion resistance of the films depended on the concentration of dopants.
机译:在本工作中,我们研究了掺杂元素和浓度对喷雾热解沉积ZnO薄膜的微观结构和电化学性能的影响。采用乙酸锌脱水锌(CH_3COO)_2·2H_2O]水溶液在400±5℃加热的条件下,通过喷雾热解法制备了氧化锌透明导电薄膜。使用AlCl 3,MgCl_2和NiCl_2作为掺杂剂。已经研究了掺杂百分比(2-4%)的影响。之后,将样品在环境空气中于500℃下热退火一小时。 X射线衍射表明,薄膜具有纤锌矿结构,并沿(002)方向优先掺杂ZnO。晶格参数a和c分别估计为3.24和5.20A。透射允许估计ZnO层的带隙。电化学研究表明,薄膜的耐蚀性取决于掺杂剂的浓度。

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