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Constructing optimal projection designs

机译:构建最佳的投影设计

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The early stages of many real-life experiments involve a large number of factors among which only a few factors are active. Unfortunately, the optimal full-dimensional designs of those early stages may have bad low-dimensional projections and the experimenters do not know which factors turn out to be important before conducting the experiment. Therefore, designs with good projections are desirable for factor screening. In this regard, significant questions are arising such as whether the optimal full-dimensional designs have good projections onto low dimensions? How experimenters can measure the goodness of a full-dimensional design by focusing on all of its projections?, and are there linkages between the optimality of a full-dimensional design and the optimality of its projections? Through theoretical justifications, this paper tries to provide answers to these interesting questions by investigating the construction of optimal (average) projection designs for screening either nominal or quantitative factors. The main results show that: based on the aberration and orthogonality criteria the full-dimensional design is optimal if and only if it is optimal projection design; the full-dimensional design is optimal via the aberration and orthogonality if and only if it is uniform projection design; there is no guarantee that a uniform full-dimensional design is optimal projection design via any criterion; the projection design is optimal via the aberration, orthogonality and uniformity criteria if it is optimal via any criterion of them; and the saturated orthogonal designs have the same average projection performance.
机译:许多现实生活实验的早期阶段涉及很多因素,其中只有少数几个因素是活跃的。不幸的是,这些早期阶段的最佳全尺寸设计可能具有不良的低尺寸投影,并且实验人员在进行实验之前不知道哪些因素最重要。因此,具有良好预测的设计对于因子筛选是理想的。在这方面,出现了很多问题,例如最佳的全尺寸设计是否在低尺寸上有良好的投影?实验者如何通过关注所有投影来衡量全尺寸设计的优劣?在全尺寸设计的最优性和其投影的最优性之间是否存在联系?通过理论上的论证,本文试图通过研究用于筛选名义或定量因素的最佳(平均)投影设计的构建,为这些有趣的问题提供答案。主要结果表明:基于像差和正交性准则,全尺寸设计在且仅当是最佳投影设计时才是最佳;当且仅当它是均匀的投影设计时,才能通过像差和正交性来优化全尺寸设计;不能保证统一的全尺寸设计是通过任何标准的最佳投影设计;如果通过像差,正交性和均匀性准则中的任何准则来优化投影设计,则它们是最优的;饱和正交设计具有相同的平均投影性能。

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