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首页> 外文期刊>Solar Energy >Preparation and characterization of Cd_xZn_(1-x)S thin films by spray pyrolysis technique for photovoltaic applications
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Preparation and characterization of Cd_xZn_(1-x)S thin films by spray pyrolysis technique for photovoltaic applications

机译:光伏热解技术制备Cd_xZn_(1-x)S薄膜的表征

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摘要

Cd_xZn_(1-x)S (x = 0, 0.2, 0.4, 0.6, 0.8, and 1) thin films were deposited by the chemical spray pyrolysis technique using a less used combination of chemicals. Depositions were done at 573 K on cleaned glass substrates. The composition, surface morphology and structural properties of deposited films were studied using EDAX, SEM and X-ray diffraction technique. XRD studies reveal that all the films are crystalline with hexagonal (wurtzite) structure and inclusion of Cd into the structure of ZnS improved the crystallinity of the films. In the entire compositions, the (0 0 2) diffraction peak is prominent which gives lattice matching to the chalcogenide semiconductor such as CuIn_xGa_(1-x)Se_2 and CuIn (s_(1-x)Se_x)_2, which are used in photovoltaic devices. The value of lattice constant 'a' and 'c' have been observed to vary with composition from 0.382 to 0.415 nm and 0.625 to 0.675 nm, respectively. The band gap of the thin films varied from 3.32 to 2.41 eV as composition varied from x = 0.0 to 1.0. It was observed that presence of small amount of cadmium results in marked changes in the optical band gap of ZnS.
机译:Cd_xZn_(1-x)S(x = 0、0.2、0.4、0.6、0.8和1)薄膜是通过化学喷雾热解技术使用较少使用的化学药品组合沉积的。在573 K下在清洁的玻璃基板上进行沉积。利用EDAX,SEM和X射线衍射技术研究了沉积膜的组成,表面形貌和结构性能。 X射线衍射研究表明,所有薄膜均为六方晶(纤锌矿)结构的晶体,并且在硫化锌中掺入镉改善了薄膜的结晶度。在整个组成中,(0 0 2)衍射峰很明显,这使硫族化物半导体(如CuIn_xGa_(1-x)Se_2和CuIn(s_(1-x)Se_x)_2)与晶格匹配。设备。已经观察到晶格常数“ a”和“ c”的值随组成分别从0.382至0.415nm和0.625至0.675nm变化。薄膜的带隙随组成从x = 0.0至1.0变化在3.32至2.41 eV之间。观察到少量的镉的存在导致ZnS的光学带隙的显着变化。

著录项

  • 来源
    《Solar Energy》 |2009年第9期|1645-1651|共7页
  • 作者单位

    Thin Film Laboratory, Department of Physics, National Institute of Technology, Surathkal 575 025, Karnataka, India;

    Thin Film Laboratory, Department of Physics, National Institute of Technology, Surathkal 575 025, Karnataka, India;

    Thin Film Laboratory, Department of Physics, National Institute of Technology, Surathkal 575 025, Karnataka, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    semiconductor thin films; spray pyrolysis; XRD; SEM; EDAX; UV-VIS spectrophotometer;

    机译:半导体薄膜;喷雾热解XRD;扫描电镜EDAX;紫外可见分光光度计;

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