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Highly sensitive NO_2 sensor based on ZnO nanostructured thin film prepared by SILAR technique

机译:基于通过Sill技术制备的ZnO纳米结构薄膜的高灵敏度NO_2传感器

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摘要

Present study reports highly sensitive, selective and rapid sub-ppm level detection of nitrogen di-oxide (NO_2) using pristine zinc oxide (ZnO) thin films prepared by a simple and efficient technique - Successive Ion Layer Adsorption and Reaction (SILAR). Synthesized ZnO thin films were characterized for their physical and chemical properties. Gas sensing studies revealed that these films are highly sensitive to NO2 with a sensor response of 249 for 20 ppm at an optimum temperature of 200 °C, with a lowest detection limit of 500 ppb. These sensors are found to be highly selective to NO_2 with fast response and recovery times (11 and 44 s for 20 ppm). XPS studies of these films have been carried out after NO_2 exposure in order to understand the sensing mechanism. Presence of nitride (N - 395.9 eV) species in N-1s spectra, decrease in binding energy position (~ 1 eV) of Zn-2p peaks along with reduction of the concentration of total oxygen species on the surface of the film (from 73 % to 54 %), indicates that NO_2 does not only interact with adsorbed oxygen but also with lattice oxygen. Optical studies (Raman and Photoluminescence) as well as observance of a higher work function value ~ 5.24 eV in pure ZnO samples established the existence of defects in these ZnO thin films, which forms the basis for their superior sensor response and faster response kinetics.
机译:目前的研究通过简单高效的技术 - 连续的离子层吸附和反应(Sill)通过简单高效的技术 - 连续的离子层吸附和反应,报告高敏感,选择性和亚PPM水平检测氮偶氮(NO_2)的氮偶氮(NO_2)。合成的ZnO薄膜的特征在于它们的物理和化学性质。气体传感研究表明,这些薄膜对No2高度敏感,传感器响应为249,20ppm,最佳温度为200℃,最低检测限为500ppb。发现这些传感器具有快速响应和恢复时间(11和44s,20 ppm)的NO_2非常有选择。在NO_2曝光之后进行了这些薄膜的XPS研究,以便理解感测机制。在N-1S光谱中存在氮化物(N - 395.9eV)物种,降低Zn-2P峰的结合能量位置(〜1V)以及薄膜表面上总氧物种浓度的降低(从73 %〜54%)表示NO_2不仅与吸附的氧气相互作用,还与晶格氧相互作用。光学研究(拉曼和光致发光)以及纯ZnO样品中较高的工作函数值〜5.24eV的鉴定建立了这些ZnO薄膜中的缺陷的存在,这构成了它们的优异传感器响应和更快的响应动力学的基础。

著录项

  • 来源
    《Sensors and Actuators》 |2021年第5期|129678.1-129678.14|共14页
  • 作者单位

    Technical Physics Division Bhabha Atomic Research Centre and Homi Bhabha National Institute Mumbai 400085 India;

    Technical Physics Division Bhabha Atomic Research Centre and Homi Bhabha National Institute Mumbai 400085 India;

    Department of Physics Government Victoria College Palakkad University of Calicut Kerala 678001 India;

    Technical Physics Division Bhabha Atomic Research Centre and Homi Bhabha National Institute Mumbai 400085 India;

    Technical Physics Division Bhabha Atomic Research Centre and Homi Bhabha National Institute Mumbai 400085 India Raja Ramanna Fellow Department of Atomic Energy India;

    Technical Physics Division Bhabha Atomic Research Centre and Homi Bhabha National Institute Mumbai 400085 India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin film; SILAR; Gas sensing; Chemiresistive; Nitrogen dioxide; Defects;

    机译:薄膜;Sill;气体传感;切片;二氧化氮;缺陷;

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