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On the switching behaviour of post-breakdown conduction in ultra-thin SiO_2 films

机译:超薄SiO_2薄膜中击穿后导通的开关行为

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Switching between well defined states of post-breakdown conduction in ultra-thin SiO_2 films is observed in both I-V and time-domain voltage (current) measurements under constant low bias current (voltage). Using I-V measurernents, single switching with two conduction states and multiple switching with more than two states was observed. The l-V characteristic of each state can be well modelled by the power law, and a convincing linear dependence is observed for each state when the I-V characteristics are plotted on a log--log scale. The switching behaviour is explained in terms of the on/off state of percolation paths of neutral electron traps due to de-trapping/trapping of the traps at certain SiO_2 lattice sites (strategic positions) during the measurements.
机译:在恒定的低偏置电流(电压)下进行I-V和时域电压(电流)测量时,都可以观察到超薄SiO_2膜中击穿后传导的定义明确的状态之间的切换。使用IV测量,观察到具有两个导通状态的单开关和具有两个以上状态的多开关。每个状态的l-V特性可以通过幂定律很好地建模,并且当将I-V特性绘制为对数-对数标度时,可以观察到每个状态的令人信服的线性相关性。根据中性电子陷阱的渗流路径的开/关状态来解释开关行为,这是由于在测量过程中陷阱在某些SiO_2晶格位置(战略位置)处的去陷阱/陷阱。

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