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Drain current collapse in GaN metal-semiconductor field-effect transistors due to surface band-bending effects

机译:由于表面带弯曲效应,GaN金属半导体场效应晶体管中的漏极电流崩溃

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摘要

The small gate length of high-frequency field-effect transistors (FETs) leads to situations where the role played by the parasitic access regions in their circuit properties becomes dominant. Due to surface band-bending effects present in wide bandgap semiconductors such as GaAs or GaN, two parasitic FETs having ungated surfaces as floating gates appear in series with the targeted one. They have to be considered properly under any electrical or optical stimulation applied. From the electrical point of view, the drain current set-up process itself leads to voltage drops along the channel that modify the surface charge of the above floating gates. By this mechanism, some surface states beside the drain terminal are charged, thus building a negatively-charged floating gate that strongly degrades the current transfer ability of the drain contact. These degraded output features are responsible for the drain current collapse observed in GaN metal-semiconductor field-effect transistors. Their recovery from this collapsed state by both electrical and optical excitations is also explained by the model.
机译:高频场效应晶体管(FET)的栅极长度短,导致寄生存取区在其电路特性中扮演的角色变得占主导地位。由于在诸如GaAs或GaN之类的宽带隙半导体中存在表面弯曲效应,两个具有未栅极化表面作为浮栅的寄生FET与目标晶体管串联出现。在施加任何电刺激或光刺激下,都必须适当考虑它们。从电气角度来看,漏极电流设置过程本身会导致沿沟道的电压下降,从而改变上述浮栅的表面电荷。通过这种机制,漏极端子旁边的一些表面状态会带电,从而建立一个带负电荷的浮栅,该浮栅会严重降低漏极触点的电流传输能力。这些降低的输出特性是造成GaN金属半导体场效应晶体管中漏极电流崩溃的原因。该模型还解释了通过电和光激发从这种塌陷状态中恢复的情况。

著录项

  • 来源
    《Semiconductor science and technology》 |2002年第12期|p.1293-1301|共9页
  • 作者

    J I Izpura;

  • 作者单位

    Departamento de Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, 28040-Madrid, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

  • 入库时间 2022-08-18 01:33:58

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