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Hot-electron energy relaxation in GaAs/GaAlAs two-dimensional Structures: importance of two-phonon processes

机译:GaAs / GaAlAs二维结构中的热电子能弛豫:两声子过程的重要性

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摘要

The energy relaxation of hot electrons has been studied in GaAs/GaAlAs two-dimensional structures with emphasis on the role of two-phonon processes for the first time. An expression for the power loss due to electron-two-zone edge transverse acoustic (TA) phonon interaction is derived using the effective carrier-two-phonon interaction Hamiltonian. Numerical calculations for the power loss are presented over a wide electron Temperature range by incorporating the electron-two-zone edge TA phonon Interaction besides the usual one-phonon scattering.
机译:已经在GaAs / GaAlAs二维结构中研究了热电子的能量弛豫,首次强调了双声子过程的作用。利用有效的载流子-两声子相互作用哈密顿量,得出了由于电子两区边缘横向声波(TA)声子相互作用而引起的功率损耗的表达式。通过结合电子两区边缘TA声子相互作用以及通常的单声子散射,在宽电子温度范围内给出了功率损耗的数值计算。

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