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Copper tin sulfide semiconductor thin films produced by heating SnS―CuS layers deposited from chemical bath

机译:通过加热化学浴中沉积的SnS-CuS层制备的硫化铜锡半导体薄膜

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Copper tin sulfide (Cu_4SnS_4) thin films have been prepared by heating a layer of CuS thin film deposited over an SnS thin film, both obtained by chemical bath deposition. Upon heating in a nitrogen atmosphere at 300―340℃, the CuS layer converts to Cu_8S_5, which reacts with the underlying SnS thin film at about 400℃ to form Cu_4SnS_4. The optical band gap of Cu_4SnS_4 has been found to be approximately 1 eV, involving direct forbidden transitions. The films are photosensitive, and the electrical conductivity in the dark is about 1 Ω~(-1) cm~(-1).
机译:已经通过加热沉积在SnS薄膜上的CuS薄膜层来制备硫化铜锡(Cu_4SnS_4)薄膜,这两者都是通过化学浴沉积获得的。在300〜340℃的氮气氛下加热后,CuS层转变为Cu_8S_5,然后在约400℃与下层SnS薄膜反应形成Cu_4SnS_4。已发现Cu_4SnS_4的光学带隙约为1 eV,涉及直接禁止的跃迁。膜是光敏的,在黑暗中的电导率约为1Ω〜(-1)cm〜(-1)。

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